X-RAY STUDY ON TITANIUM NITRIDE FILMS DEPOSITED BY VCAD METHOD

来源期刊：中国有色金属学报(英文版)1992年第1期

论文作者：Liu Xingcheng Yuan Zhenhai Dai Dahuan

文章页码：65 - 68

Key words：VCAD method, TiN Film, X-ray

Abstract: TiN films deposited by the VCAD method at the substrate of stainless steel and superhigh speed tool steels are uniform and dense. Their colour, orientation and lattice parameter depend on deposited condition The lattice structure of deposited film, the change of the lattice parameter and its preferred orientation were studied by the XRD method, different behaviours of TiNx film were analysed. The lattice parameter of TiNx films is increased with the nitrogen content and The colour of TiNx film is strongly related to the content of Nitrogen also. The change of preferred orientation depends mainly on the Bias.