简介概要

Resistance Switching Properties of Ag/ZnMn2O4/p-Si Fabricated by Magnetron Sputtering for Resistance Random Access Memory

来源期刊:Journal Of Wuhan University Of Technology Materials Science Edition2015年第6期

论文作者:王华 LI Zhida XU Jiwen ZHANG Yupei YANG Ling QIU Wei

文章页码:1159 - 1162

摘    要:A resistance random access memory(RRAM) with a structure of Ag/ZnMn2O4/p-Si was fabricated by magnetron sputtering method. Reliable and repeated switching of the resistance of ZnMn2O4 fi lms was obtained between two well-defi ned states of high and low resistance with a narrow dispersion and 3V switching voltages. Resistance ratio of the high resistance state and low resistance state was found in the range of around 103 orders of magnitude and up to about 103 test cycles. The retention time of Ag/ZnMn2O4/p-Si device is longer than 106 seconds and the resistance ratio between two states remains higher than 103 at room temperature, showing a remarkable reliability performance of the RRAM devices for nonvolatile memory application. The equivalent simulation circuits for HRS(high resistance state) and LRS(low resistance state) were also studied by impedance spectroscopy.

详情信息展示

Resistance Switching Properties of Ag/ZnMn2O4/p-Si Fabricated by Magnetron Sputtering for Resistance Random Access Memory

王华,LI Zhida,XU Jiwen,ZHANG Yupei,YANG Ling,QIU Wei

School of Materials Science and Engineering, Guilin University of Electronic Technology

摘 要:A resistance random access memory(RRAM) with a structure of Ag/ZnMn2O4/p-Si was fabricated by magnetron sputtering method. Reliable and repeated switching of the resistance of ZnMn2O4 fi lms was obtained between two well-defi ned states of high and low resistance with a narrow dispersion and 3V switching voltages. Resistance ratio of the high resistance state and low resistance state was found in the range of around 103 orders of magnitude and up to about 103 test cycles. The retention time of Ag/ZnMn2O4/p-Si device is longer than 106 seconds and the resistance ratio between two states remains higher than 103 at room temperature, showing a remarkable reliability performance of the RRAM devices for nonvolatile memory application. The equivalent simulation circuits for HRS(high resistance state) and LRS(low resistance state) were also studied by impedance spectroscopy.

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