电感耦合等离子体原子发射光谱法测定铜锍及含铜烧结物料中铜、砷、硅含量

来源期刊：冶金分析2011年第6期

论文作者：赵淑云 王成 葛钰玮 彭秧

文章页码：26 - 30

关键词：电感耦合等离子体原子发射光谱法； 铜锍； 含铜烧结物料； 铜； 砷； 硅

Key words：inductively coupled plasma atomic emission spectrometry； copper matte； copper sinters； copper； arsenic； silicon

摘    要：采用过氧化钠-氢氧化钠在银坩埚中熔融试样,在体积分数为5%的盐酸介质中,用电感耦合等离子体原子发射光谱法(ICP-AES)测定铜锍及含铜烧结物料中铜、砷、硅含量。对元素分析线、熔样方法、测定溶液介质、基体干扰进行了讨论。结果表明,在最佳实验条件下,铜、砷、硅的检出限分别为0.03、0.05、0.03μg/mL;使用该法分析实际样品,分析结果与其它常规方法测定值一致,相对标准偏差小于3%,回收率在94%~106%之间。该方法适用于大宗铜锍及含铜烧结物料中铜、砷、硅含量的快速测定。

Abstract: The content of copper,arsenic and silicon in copper matte and copper sinters were determined by inductively coupled plasma atomic emission spectrometry using 5%(V/V) hydrochloric acid as medium after the sample was melted in a silver crucible with sodium peroxide and sodium hydroxide.The experiment conditions were discussed,such as analytical spectral lines for elements,sample melting method,determination medium and matrix interference.Under the optimal conditions,the detection limits of copper,arsenic and silicon were 0.03,0.05 and 0.03 μg/mL,respectively.This method has been applied to the determination of actual samples,and the results were consistent with those obtained by other conventional methods with relative standard deviations (RSD) less than 3% and recoveries of 94%-106%.The proposed method in this study was applicable for the rapid determination of copper,arsenic and silicon in a large amount of copper matte and copper sinters.