Effects of heat treatment process on thin film alloy resistance and its stability
来源期刊：中南大学学报(英文版)2003年第2期
论文作者：周继承 彭银桥
文章页码：91 - 93
Key words：thin film alloy resistance; heat treatment; stability; pressure sensors
Abstract: Alloy thin film for advanced pressure sensors was manufactured by means of ion-beam sputtering SiO2 insulation film and NiCr thin film on the 17-4PHstainless steel elastic substrate. The thin film resistance was respectively heattreated by four processes. The effects on stability of thin film alloy resistance were investigated, and paramaters of heat treatment that make thin film resistance stable were obtained. The experimental result indicates that the most stable thin film resistance can be obtained when it is heat-treated under protection of SiO2and N2 at 673 K for 1 h, and then kept at 473 K for 24 h. Pressure sensor chips of high precision for harsh environments can be manufactured by this process.
