Plasma enhanced diamond deposition on steel and Si substrates
来源期刊：Acta Metallurgica Sinica2009年第5期
论文作者：Y.S. Li Q. Yang A. Hirose Y. Tang C. Xiao W. Chen
Key words：Plasma CVD; Diamond film; Steel; Si;
Abstract: Diamond growth on Fe-Cr-Al-Si steel and Si substrates was comparatively investigated in microwave plasma enhanced chemical vapor deposition (MPCVD) reactor with different deposition parameters. Adherent nanocrystalline diamond films were directly deposited on this steel substrate under a typical deposition condition, whereas microcrystalline diamond films were produced on Si wafer. With increasing CH4 concentration, reaction pressure, or the total gas flow rate, the quality of nanocrystalline diamond films formed on Fe-Cr-Al-Si substrates is gradually deteriorated in terms of density and adhesion. This impaired diamond quality on steels is primarily associated with a combined effect by the substrate composition and the specific process conditions that favor excessive nucleation of diamond.
Y.S. Li1，Q. Yang2，A. Hirose1，Y. Tang1，C. Xiao1，W. Chen1
(1.Plasma Physics Laboratory, University of Saskatchewan, Saskatoon, SK S7N 5E2, Canada;
2.Department of Mechanical Engineering, University of Saskatchewan, Saskatoon, S7N 5A9, Canada)
Abstract:Diamond growth on Fe-Cr-Al-Si steel and Si substrates was comparatively investigated in microwave plasma enhanced chemical vapor deposition (MPCVD) reactor with different deposition parameters. Adherent nanocrystalline diamond films were directly deposited on this steel substrate under a typical deposition condition, whereas microcrystalline diamond films were produced on Si wafer. With increasing CH4 concentration, reaction pressure, or the total gas flow rate, the quality of nanocrystalline diamond films formed on Fe-Cr-Al-Si substrates is gradually deteriorated in terms of density and adhesion. This impaired diamond quality on steels is primarily associated with a combined effect by the substrate composition and the specific process conditions that favor excessive nucleation of diamond.
Key words:Plasma CVD; Diamond film; Steel; Si;
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