Effect of Polymer Inclusion in Preparation of Thick LZO Buffer Layers for YBCO Coated Conductors
来源期刊：JOURNAL OF MATERIALS SCIENCE TECHNOLOG2013年第3期
论文作者：Vyshnavi Narayanan Isabel Van Driessche
文章页码：261 - 266
摘 要：<正>In this work,water-based precursor solutions suitable for dip-coating of thick La2Zr2O7（LZO） buffer layers for coated conductors on Ni-5%W substrates with an inclusion of polymeric polyvinyl pyrrolidone were developed.The effect of varying percentage of the polymer addition on the preparation of the deposited films with maximum crack-free thickness was investigated.This novel water-based chemical solution deposition method involving polymers in two different chelate-chemistry compositions revealed the possibility to grow single,crack-free layers with thicknesses ranging from 140 to 280 nm,with good crystallinity and epitaxial growth.The effect of increasing polymer concentrations on the morphology and the structure of the films was studied.The appropriate buffer layer action of the films in preventing Ni diffusion was studied by X-ray photoelectron spectroscopy.
Vyshnavi Narayanan，Isabel Van Driessche
Sol-gel Centre for Research on Inorganic Powders and Thin film Synthesis-SCRiPTS,Department of Inorganic and Physical Chemistry,Ghent University,Krijgslaan 281-S3,B-9000 Gent,Belgium
摘 要：<正>In this work,water-based precursor solutions suitable for dip-coating of thick La2Zr2O7（LZO） buffer layers for coated conductors on Ni-5%W substrates with an inclusion of polymeric polyvinyl pyrrolidone were developed.The effect of varying percentage of the polymer addition on the preparation of the deposited films with maximum crack-free thickness was investigated.This novel water-based chemical solution deposition method involving polymers in two different chelate-chemistry compositions revealed the possibility to grow single,crack-free layers with thicknesses ranging from 140 to 280 nm,with good crystallinity and epitaxial growth.The effect of increasing polymer concentrations on the morphology and the structure of the films was studied.The appropriate buffer layer action of the films in preventing Ni diffusion was studied by X-ray photoelectron spectroscopy.
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