Microfabrication and Performance of Annealed NiTi Shape Memory Thin Films by Sputtering for Microdevice Applications
来源期刊：材料热处理学报2004年第5期
论文作者：GONG Feng-fei
关键词：NiTi; Shape Memory Thin Films; Microfabrication; Performance; Microdevice Applications; Complex system;
摘 要：The microfabrication and performance NiTi shape memory thin films for microdevice applications were studied by microfabrication processes, which were compatible with those of microelectronics fabrication processes. The sputter-deposition conditions, patterning process, and annealing conditions were investigated. The B2 crystal structures of the thin films can be obtained by annealing at 525℃ for 30min. The results from x-ray photoemission spectroscopy indicated that the atomic concentration in the surface of the annealed thin films with preferred structures is comparable with those of the as-deposited films.
GONG Feng-fei1
(1.Physics Dept., East China Normal University, Shanghai 200062, China)
摘要:The microfabrication and performance NiTi shape memory thin films for microdevice applications were studied by microfabrication processes, which were compatible with those of microelectronics fabrication processes. The sputter-deposition conditions, patterning process, and annealing conditions were investigated. The B2 crystal structures of the thin films can be obtained by annealing at 525℃ for 30min. The results from x-ray photoemission spectroscopy indicated that the atomic concentration in the surface of the annealed thin films with preferred structures is comparable with those of the as-deposited films.
关键词:NiTi; Shape Memory Thin Films; Microfabrication; Performance; Microdevice Applications; Complex system;
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