Microstructure and physical properties of PVD TiN/(Ti, Al)N multilayer coatings

来源期刊:中国有色金属学报(英文版)2005年第5期

论文作者:吴恩熙 陈利 尹飞 汪秀全

文章页码:1072 - 1076

Key words:PVD; (Ti, Al)N monolayer coating; TiN/(Ti, Al)N multilayer coatings; cemented carbide

Abstract: Magnetron sputtered (Ti, Al)N monolayer and TiN/(Ti, Al)N multilayer coatings grown on cemented carbide substrates were studied by using energy dispersive X-ray spectroscopy(EDX), scanning electron microscopy(SEM), nanoindentation, Rockwell A indentation test, strength measurements and cutting tests. The results show that the (Ti, Al)N monolayer and TiN/(Ti, Al)N multilayer coatings perform good affinity to substrate, and the TiN/(Ti, Al)N multilayer coating exhibits higher hardness, higher toughness and better cutting performance compared with the (Ti, Al)N monolayer coating. Moreover, the strength measurement indicates that the physical vapour deposition (PVD) coating has no effect on the substrate strength.

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