SnOx Thin Films Deposited by Reactive Magnetron Sputtering for Microbatteries Anodes
来源期刊：材料保护2004年增刊第2期
论文作者：SHEN Wan YANG Zhi-min DU Jun MAO Chang-hui XING Guang-jian
关键词：SnOx thin films; XRD; XPS; microbatteries anodes;
摘 要：SnOx thin films, with various oxygen deficiencies, are deposited from a Sn target on to silicon substratesby reactive magnetron sputtering. The SnOx films are characterized by X-ray diffraction ( XRD ) and X-ray photoelectron spectroscopy(XPS). Influences of deposition conditions such as oxygen partial pressure and annealing temperature on the characteristicsof the films are discussed in detail. The high reversible capacity and cycle performance characteristics of SnOxare also described. The results show that stoichiometric parameter x increases with the increase in oxygen partial pressure. The chargedischarge performance of the SnOxfilms is found to be dependent on x value.
SHEN Wan1，YANG Zhi-min1，DU Jun1，MAO Chang-hui1，XING Guang-jian1
(1.Research Center of Energy Materials and Technology, General Research Institute for Nonferrous Metals, Beijing 100088, P.R. China)
摘要:SnOx thin films, with various oxygen deficiencies, are deposited from a Sn target on to silicon substratesby reactive magnetron sputtering. The SnOx films are characterized by X-ray diffraction ( XRD ) and X-ray photoelectron spectroscopy(XPS). Influences of deposition conditions such as oxygen partial pressure and annealing temperature on the characteristicsof the films are discussed in detail. The high reversible capacity and cycle performance characteristics of SnOxare also described. The results show that stoichiometric parameter x increases with the increase in oxygen partial pressure. The chargedischarge performance of the SnOxfilms is found to be dependent on x value.
关键词:SnOx thin films; XRD; XPS; microbatteries anodes;
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