Phase evolution of tantalum nitride and tantalum carbide films with PBII parameters
来源期刊：Rare Metals2011年第2期
论文作者：LI Zhongwen a,GU Le b,TANG Guangze a,MA Xinxin c,SUN Mingren a,and WANG Liqin b a School of Materials Science & Engineering,Harbin Institute of Technology,Harbin ,China b School of Mechatronics Engineering,Harbin Institute of Technology,Harbin ,China c State Key Lab of Advanced Welding Production Technology,Harbin Institute of Technology,Harbin ,China
文章页码：142 - 145
摘 要：Tantalum nitride and tantalum carbide films were fabricated using magnetron sputtering of tantalum followed by nitrogen and carbon plasma-based ion implantation （N-PBII and C-PBII）.The phase evolution and morphology of the films were studied using glancing angle X-ray diffraction （GXRD） and transmission electron microscopy （TEM）.It was found that the main phase in the tantalum nitride films was crystalline TaN0.1 whose grain size increases with increasing implantation voltage and phase content increases with increasing implantation dose.In the tantalum carbide film,the main phase was Ta2C.TaC phase also appeared as the implantation dose increased.XRD results from various glancing angles show that the phases with high nitrogen or carbon content,Ta4N5 and TaC,are present in the surface of the films.X-ray photoelectron spectra （XPS） from the tantalum carbide film reveal that the surface carbon content is higher than that of the inner film.
摘要：Tantalum nitride and tantalum carbide films were fabricated using magnetron sputtering of tantalum followed by nitrogen and carbon plasma-based ion implantation （N-PBII and C-PBII）.The phase evolution and morphology of the films were studied using glancing angle X-ray diffraction （GXRD） and transmission electron microscopy （TEM）.It was found that the main phase in the tantalum nitride films was crystalline TaN0.1 whose grain size increases with increasing implantation voltage and phase content increases with increasing implantation dose.In the tantalum carbide film,the main phase was Ta2C.TaC phase also appeared as the implantation dose increased.XRD results from various glancing angles show that the phases with high nitrogen or carbon content,Ta4N5 and TaC,are present in the surface of the films.X-ray photoelectron spectra （XPS） from the tantalum carbide film reveal that the surface carbon content is higher than that of the inner film.
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