Morphology Study of Oriented Sm BCO Film Deposited by MOCVD

汪婷¹，涂溶¹，KE Wang¹，ZHANG Song¹，ZHANG Lianmeng^1,2，Takashi GOTO²

1. State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology2. Institute for Materials Research,Tohoku University

摘 要：c-axis-oriented SmBa₂Cu₃O₇（SmBCO） films have been deposited on（100）- LaA1O₃（LAO）substrate by metal organic chemical vapor deposition（MOCVD） technique.The effects of deposition temperature(T_dep) and total pressure(P_tot) on the orientation and microstructure of SmBCO films were investigated.The orientation of SmBCO films transformed from α-axis to c-axis with increasing of T_dep from 900 to 1 100℃.At T_dep=1 050℃,SmBCO films had c-axis orientation and tetragon surface.At P_tot^dep=400-800 Pa and T_dep=1 050 ℃,totally c-axis-oriented SmBCO films were obtained.The R_dep of SmBCO films increased firstly and then decreased with increasing P_tot.The surface of SmBCO films exhibited tetragon morphology at 1 050 ℃ and400 Pa.Maximum thickness of SmBCO film deposited was 1.2μm at P_tot= 600 Pa,and the corresponding R_depwas 7.2 μm·h^-1.

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