Research of the Effects of Electron Focused Electric Field upon an Enhanced Glow Discharge Plasma Ion Implantation
来源期刊：材料保护2004年增刊第2期
论文作者：Chu Paul K ZHANG Yan-hua Wu Yong-qin CAI Xun
关键词：PBII; enhanced glow discharge plasma ion implantation; finite-element;
摘 要：A new Enhanced Glow Discharge Plasma Ion Implantation methods are introduced, in which the plasma are produced by the self glow discharge excitated by high negative voltage bias. The electric field is designed to a electron focusing mode by using a small area hollow anode and a large area sample holder cathode. The pattern of equipotentials of the electric field are calculated through finite-element method. By using the special electron-focusing field, the self glow discharge are enhanced and provide denser ions to implanted into the substrate.
Chu Paul K1，ZHANG Yan-hua2，Wu Yong-qin2，CAI Xun3，LI Liu-he2
(1.Dept. of Physics & Materials Science, City University of Hong Kong,Kowloon, Hong Kong;
2.School of Mechanical Engineering and Automation , Beijing University of Aeronautics and Astronautics. Beijing, 100083;
3.School of Materials Science and Technology, Shanghai Jiao Tong University,Shanghai 200240 P. R. China;
4. School of Materials Science and Technology, Shanghai Jiao Tong University,Shanghai 200240 P. R. China)
摘要:A new Enhanced Glow Discharge Plasma Ion Implantation methods are introduced, in which the plasma are produced by the self glow discharge excitated by high negative voltage bias. The electric field is designed to a electron focusing mode by using a small area hollow anode and a large area sample holder cathode. The pattern of equipotentials of the electric field are calculated through finite-element method. By using the special electron-focusing field, the self glow discharge are enhanced and provide denser ions to implanted into the substrate.
关键词:PBII; enhanced glow discharge plasma ion implantation; finite-element;
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