简介概要

MEVVA磁过滤等离子技术制备的Fe纳米颗粒薄膜结构

图书来源:二元合金相图及中间相晶体结构 二元合金相图及中间相晶体结构

作 者:唐仁政 田荣璋

出版时间:2009-05

定 价:320元

图书ISBN:978-7-81105-831-4

出版单位:中南大学出版社

详情信息展示

Growth kinetics of cubic carbide free layers in graded cemented carbides

Liu-yong Shi1,2), Yi-min Liu1), Ji-hua Huang1), Shou-quan Zhang3), and Xing-ke Zhao1) 1) School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China 2) College of Mechanical and Electrical engineering, Hainan University, Danzhou 571737, China 3) Xiamen Golden Egret Special Alloy Co. Ltd., Xiamen 361006, China

摘 要:In order to reveal the formation mechanism of cubic carbide free layers (CCFL), graded cemented carbides with CCFL in the surface zone were fabricated by a one-step sintering procedure in vacuum, and the analysis on microstructure and element distribution were performed by scanning electron microscopy (SEM) and electron probe micro-analyzer (EPMA), respectively. A new physical model and kinetic equation were established based on experimental results. Being different from previous models, this model suggests that nitrogen diffusion outward is only considered as an induction factor, and the diffusion of titanium through liquid phase plays a dominative role. The driving force of diffusion is expressed as the differential value between nitrogen partial pressure and nitrogen equilibrium pressure essentially. Simulation results by the kinetic equation are in good agreement with experimental values, and the effect of process parameters on the growth kinetics of CCFL can also be explained reasonably by the current model.

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