离子束增强沉积工艺对镀层表面粗糙度的影响
来源期刊:中国有色金属学报2000年第z1期
论文作者:唐宾 秦林 朱晓东 徐重
文章页码:184 - 187
关键词:离子束增强沉积; 粗糙度; 结合强度; 氮化钛
Key words:IBED; roughness; bonding strength; TiN
摘 要:研究了不同界面共混工艺对精密轴承镀层表面粗糙度的影响。结果表明 ,用氮离子进行界面反冲共混 ,在动态反冲共混过程中 ,随着氮离子能量的增高 ,氮离子选择溅射和界面碳富集造成界面上沉积的镀层表面粗糙度相应增大 ,而对于在工件表面预先沉积一层纯钛的静态反冲共混工艺 ,镀层具有较低的表面粗糙度。当氮离子能量为 40keV时 ,静态反冲共混界面具有高的镀膜基体结合力。
Abstract: The effects of ion recoiling process on surface roughness of precise bearing balls and bonding strength of coating substrate interface were studied. The results show that with increasing N ions energy in the dynamic recoiling process, the surface roughness increases, the coating bonding strength decreases because of selective construction and interface carbon enrichment. When adopting static recoiling process with N ions energy of 40 keV, surface roughness is low and bonding strength of interface is enhanced.