D⁺离子束辐照对Ti膜的影响

来源期刊：金属学报2010年第7期

论文作者：王博宇 向伟 谈效华 戴晶怡 程亮 秦秀波

文章页码：810 - 813

关键词：D⁺； Ti膜； 慢正电子湮没技术

Key words：D⁺； Ti film； slow positron annihilation spectroscopy

摘    要：在加速器上,利用不同能量的D⁺离子束对Ti膜进行连续辐照,利用慢正电子湮没技术和SEM对束流辐照前后Ti膜进行表征.结果表明,D⁺离子束对Ti膜造成辐照损伤,随D⁺离子束能量增大,辐照损伤的程度加重;辐照损伤最大值在0.3μm处;D⁺离子束对Ti膜表面造成不同程度的烧蚀,随D⁺离子束能量增加,膜表面烧蚀程度增加,膜表面几何不均匀性导致膜表面出现选择性烧蚀.数值计算表明,随能量增加,D⁺离子在Ti膜中的能量沉积增大,这与SEM观测结果相符.

Abstract: Effect of the D⁺ ion beam on Ti film is studied by radiating the Ti films with different energy D⁺ beams on electrostatic accelerator.Slow positron annihilation spectroscopy and SEM are used to characterize the films.With the D⁺ beam energy increases,the extent of radiation damage and the surface ablation of Ti films increase.The maximum of radiation damage locates at 0.3μm depth.The geometrical non-uniformity on original surface is the main reason for the ablation behavior on Ti films by inducing a selective ablation under radiation.Radiation damage and energy loss of D⁺ in Ti film are discussed in detail by the numerical simulation of the beam and the solid interaction. It shows that the maximum radiation damage is at 0.65μm depth and energy loss of D⁺ beam in Ti films accords with the experimental observation.