Fabrication,characterization and optimization of high conductivity and high quality nanocrystalline molybdenum thin films
来源期刊：JOURNAL OF MATERIALS SCIENCE TECHNOLOG2019年第11期
论文作者：Anil K.Battu Nanthakishore Makeswaran C.V.Ramana
文章页码：2734 - 2741
摘 要：The present study investigated the influence of substrate temperature（Ts） and working pressure(PAr)on tailoring the properties of nanocrystalline（nc） molybdenum（Mo） films fabricated by radio-frequency magnetron sputtering.The structural,morphological,electrical and optical properties of nc-Mo films were evaluated in detail.The Mo films exhibited（110） orientation with average crystallite size varying from 9 to 22（±1） nm on increasing Ts.Corroborating with structural data,the electrical resistivity decreased from 55 μΩ cm to 10 μΩ cm,which is the lowest among all the Mo films.For Mo films deposited under variable PAr.the（110） peak intensity decrement coupled with peak broadening on increasing PAr.Lower deposition pressure yielded densely packed thin films with superior structural properties along with low resistivity of 15 μΩ cm.Optimum conditions to produce high quality Mo films with excellent structural,morphological,electrical and optical characteristics for utilization in solar cells as back contact layers were identified.
Anil K.Battu1,2，Nanthakishore Makeswaran1，C.V.Ramana1
1. Center for Advanced Materials Research (CMR),University of Texas at El Paso2. Environmental Molecular Sciences Laboratory (EMSL),Pacific Northwest National Laboratory (PNNL)
摘 要：The present study investigated the influence of substrate temperature（Ts） and working pressure(PAr)on tailoring the properties of nanocrystalline（nc） molybdenum（Mo） films fabricated by radio-frequency magnetron sputtering.The structural,morphological,electrical and optical properties of nc-Mo films were evaluated in detail.The Mo films exhibited（110） orientation with average crystallite size varying from 9 to 22（±1） nm on increasing Ts.Corroborating with structural data,the electrical resistivity decreased from 55 μΩ cm to 10 μΩ cm,which is the lowest among all the Mo films.For Mo films deposited under variable PAr.the（110） peak intensity decrement coupled with peak broadening on increasing PAr.Lower deposition pressure yielded densely packed thin films with superior structural properties along with low resistivity of 15 μΩ cm.Optimum conditions to produce high quality Mo films with excellent structural,morphological,electrical and optical characteristics for utilization in solar cells as back contact layers were identified.
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