三价铬水溶液电镀非晶态铬工艺

来源期刊：中国有色金属学报1999年第3期

论文作者：何湘柱 龚竹青 蒋汉瀛

文章页码：646 - 650

关键词：三价铬电镀；非晶态； 添加剂

Key words：Chromium(Ⅲ) electroplating; amorphous state; additives

摘    要：报导了一种Cr³⁺水溶液中电镀非晶态铬新工艺。采用由适当的络合剂、稳定剂、添加剂以及Cr³⁺盐组成的电镀液，于室温下电沉积出厚度达11 μm、外观接近镜面的非晶态铬镀层。实验发现，蓝膜的生成是光亮非晶态Cr层得以电沉积出来的首要条件。采用X射线衍射和扫描电子显微镜等方法对铬镀层的结构进行了分析。结果表明，铬镀层的X射线衍射图中只有非晶态铬的宽化峰；扫描电子显微镜结果显示所得Cr镀层没有针孔，只有少数细小的裂纹。对Cr³⁺水溶液中电镀Cr的工艺条件和络合剂、稳定剂、添加剂的作用进行了探讨。

Abstract: A new formula containing complexing agents, stabilizer and additives was reported for the electrodeposition of amorphous chromium in Cr(Ⅲ) aqueous solution. At room temperature, up to 11 μm thick deposit was obtained with a mirror like appearance. A blue film was found on the substrate before the commence of chromium deposition and is thought to be a prerequisite for the deposition of bright amorphous chromium. X-ray diffraction (XRD) and scanning electron microscope (SEM) were used to characterize the properties of the chromium deposits. XRD exhibited only broad humps for amorphous chromium and SEM showed that the deposit contains only a few fine cracks but no pinholes. The operation parameters and the roles of the complexing agents, stabilizer and additives were briefly discussed.

基金信息：国家自然科学基金资助项目