简介概要

MAGNETORESISTANCE EFFECT OBSERVED IN Fe/Mo MULTILAYERS PREPARED BY ELECTRON BEAM EVAPORATION

来源期刊:Acta Metallurgica Sinica2003年第3期

论文作者:F.Zeng F.Pan B.Zhao T.He Y.Gao

Key words:magnetoresistance; multilayer; antiferromagnetic interlayer coupling; nonmagnetic scattering;

Abstract: The Fe/Mo multilayers were prepared by electron beam evaporation, the microstructure and magnetic properties of the multilayers were studied by X-ray diffraction, vibratingsample magnetometer (VSM) et al. The experimental results revealed that the Fe/Mo multilayers in our experimental conditions behaved magnetoresistance effect with a sharp peak on magnetoresistance (MR) ratio curve, and magnetoresistance is easily saturated at low applied magnetic fields. For [Fe(1.5nm)/Mo(1.0nm)]42 multilayers,MR ratio could arrive to 0.1%. The antiferromagnetic interlayer coupling could be observed in some films at room temperature. The strength of the antiferromagnetic interlayer coupling J in the films is low because of the low saturation field Hs. The relationship between magnetic properties and microstructure was also discussed in this paper.

详情信息展示

MAGNETORESISTANCE EFFECT OBSERVED IN Fe/Mo MULTILAYERS PREPARED BY ELECTRON BEAM EVAPORATION

F.Zeng1,F.Pan1,B.Zhao1,T.He1,Y.Gao1

(1.Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University,Beijing,100084, China)

Abstract:The Fe/Mo multilayers were prepared by electron beam evaporation, the microstructure and magnetic properties of the multilayers were studied by X-ray diffraction, vibratingsample magnetometer (VSM) et al. The experimental results revealed that the Fe/Mo multilayers in our experimental conditions behaved magnetoresistance effect with a sharp peak on magnetoresistance (MR) ratio curve, and magnetoresistance is easily saturated at low applied magnetic fields. For [Fe(1.5nm)/Mo(1.0nm)]42 multilayers,MR ratio could arrive to 0.1%. The antiferromagnetic interlayer coupling could be observed in some films at room temperature. The strength of the antiferromagnetic interlayer coupling J in the films is low because of the low saturation field Hs. The relationship between magnetic properties and microstructure was also discussed in this paper.

Key words:magnetoresistance; multilayer; antiferromagnetic interlayer coupling; nonmagnetic scattering;

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