Electro-deposition tangsten coating on low activation steel substrates from Na2WO4-ZnO-WO3 melt salt
来源期刊：Rare Metals2012年第4期
论文作者：LIU Yanhong,ZHANG Yingchun,LIU Qizong,and GE Changchun School of Material Science and Engineering,University of Science and Technology Beijing,Beijing ,China
文章页码：350 - 354
摘 要：Tungsten coating is considered as a promising alternative material for plasma facing materials（PFC） in future fusion devices.The electro-deposition of tungsten in Na2WO4-ZnO-WO3 melt at 1173 K on low activation steel substrates was studied in this work.Adherent and smooth tungsten films were deposited under various pulsed current conditions.The crystal structure and microstructure of tungsten deposits were characterized by XRD,SEM and EDX techniques.The results show that pulsed current density and duty cycle have a significant influence on tungsten nucleation and electro-crystallization phenomena.Uniform and smooth tungsten coating with high purity and high adherence is obtained on low active steel substrates as cathodic current density ranges from 35 to 25 mA·cm-2.
LIU Yanhong,ZHANG Yingchun,LIU Qizong,and GE Changchun School of Material Science and Engineering,University of Science and Technology Beijing,Beijing 100083,China
摘 要：Tungsten coating is considered as a promising alternative material for plasma facing materials（PFC） in future fusion devices.The electro-deposition of tungsten in Na2WO4-ZnO-WO3 melt at 1173 K on low activation steel substrates was studied in this work.Adherent and smooth tungsten films were deposited under various pulsed current conditions.The crystal structure and microstructure of tungsten deposits were characterized by XRD,SEM and EDX techniques.The results show that pulsed current density and duty cycle have a significant influence on tungsten nucleation and electro-crystallization phenomena.Uniform and smooth tungsten coating with high purity and high adherence is obtained on low active steel substrates as cathodic current density ranges from 35 to 25 mA·cm-2.
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