PREPARATION AND SURFACE CHARACTERIZATION OF TiO2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD
来源期刊：Acta Metallurgica Sinica2002年第2期
论文作者：J.X.Zhang H.Shen L.S.Yin
Key words：TiO2; thin film. magnetron. sputtering;
Abstract: Ti thin films were firstly deposited on glass substrates by magnetron sputtering method,then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thinfilms on glass substrates were obtained. The structure and surface morphologies ofthe thin films were characterized by X-ray diffraction and SEM. The growth processof the thin filns has been observed. The annealing time and annealing temperatureshave an affect on the growth of the films.
J.X.Zhang1，H.Shen2，L.S.Yin3
(1.Department of Physics,Zhongshan University,Guangzhou 510275,China;
2.Guangzhou Institute of Energy Conversion,CAS,Guangzhou 510070,China;
3.College of Information Engineering,Central Sonth University,Changsha 410075,China)
Abstract:Ti thin films were firstly deposited on glass substrates by magnetron sputtering method,then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thinfilms on glass substrates were obtained. The structure and surface morphologies ofthe thin films were characterized by X-ray diffraction and SEM. The growth processof the thin filns has been observed. The annealing time and annealing temperatureshave an affect on the growth of the films.
Key words:TiO2; thin film. magnetron. sputtering;
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