Pulsed DC plasma enhanced chemical vapor deposited TiN/Ti(C,N) multilayer coatings

来源期刊：中国有色金属学报(英文版)2000年第4期

论文作者：马胜利 李雁淮 南俊马 徐可为

文章页码：489 - 492

Key words：PCVD; TiN/Ti(C,N) multilayer coating; microstructures; properties

Abstract: TiN single coatings and TiN/Ti(C,N) multilayer coatings deposited on Cr12MoV substrate have been completed by pulsed DC plasma enhanced chemical vapor deposition(PCVD) process. The SEM, XRD and microvicker’s hardness as well as the indentation test were used to study the microstructure and mechanical properties of TiN/Ti(C,N) multilayer coatings. The results show that TiN/Ti(C,N) coatings are fine and have free-column structure, and carbon atoms take the place of some nitrogen atoms in Ti(C,N) coatings when lower flow ratio of CH4is used. The microvicker’s hardness and interfacial adhesion between TiN/Ti(C,N) coatings and Cr12MoV substrate increases more obviously than that of TiN single hard coatings due to the more dense and free-column structure when process is optimized.