Calculation of interaction of AlCl, AlCl2 and AlCl3 on Al4C3 (001) Al4CO4 (001) and Al2CO (001) planes
来源期刊:中南大学学报(英文版)2015年第1期
论文作者:DUAN Shao-fei(段少飞) CHEN Xiu-min(陈秀敏) YANG Bin(杨斌) YU Qing-chun(郁青春) XU Bao-qiang(徐宝强) LIU Da-chun(刘大春)
文章页码:43 - 58
Key words:Ab initio; chloride reaction; carbothermic reduction; Al4C3; Al4CO4; Al2CO
Abstract: To make sure the intermediate products of the carbothermic reduction of Al2O3 process, such as Al4CO4, Al2CO and Al4C3, and the interaction of AlCl, AlCl2, AlCl3 with Al4CO4, Al2CO and Al4C3, respectively, thermodynamic analyses were used to study the chloride reaction production of them under the vacuum situation. The stable structures and electronic properties of AlCl, AlCl2 and AlCl3 adsorbed on Al4CO4, Al2CO and Al4C3 were calculated by first-principles calculations by the CASTEP module in the Materials Studio program. The results show that the AlCl3 and AlCl2 molecules have decomposed on the plane of Al4C3 (001), while there are no obvious decomposition of AlCl3 and AlCl2 on Al4CO4 (001) and Al2CO (001) planes. The adsorption of AlCl on the Al4CO4 (001) and Al2CO (001) planes is stronger than that on the Al4C3(001) plane. The interaction strength of AlCl3, as well as AlCl2, with Al4CO4, Al2CO and Al4C3 is in the sequence of Al4CO4<Al2CO<Al4C3, while the interaction strength of AlCl with Al4CO4, Al2CO and Al4C3 is in the sequence of Al4CO4>Al2CO>Al4C3.
DUAN Shao-fei(段少飞)1, 2, CHEN Xiu-min(陈秀敏)1, 2, YANG Bin(杨斌)1, 2, YU Qing-chun(郁青春)1, 2, XU Bao-qiang(徐宝强)1,2, LIU Da-chun(刘大春)1,2
(1. National Engineering Laboratory for Vacuum Metallurgy
(Kunming University of Science and Technology), Kunming 650093, China;
2. Yunnan Provincial Key Laboratory of Nonferrous Vacuum Metallurgy, Kunming 650093, China)
Abstract:To make sure the intermediate products of the carbothermic reduction of Al2O3 process, such as Al4CO4, Al2CO and Al4C3, and the interaction of AlCl, AlCl2, AlCl3 with Al4CO4, Al2CO and Al4C3, respectively, thermodynamic analyses were used to study the chloride reaction production of them under the vacuum situation. The stable structures and electronic properties of AlCl, AlCl2 and AlCl3 adsorbed on Al4CO4, Al2CO and Al4C3 were calculated by first-principles calculations by the CASTEP module in the Materials Studio program. The results show that the AlCl3 and AlCl2 molecules have decomposed on the plane of Al4C3 (001), while there are no obvious decomposition of AlCl3 and AlCl2 on Al4CO4 (001) and Al2CO (001) planes. The adsorption of AlCl on the Al4CO4 (001) and Al2CO (001) planes is stronger than that on the Al4C3(001) plane. The interaction strength of AlCl3, as well as AlCl2, with Al4CO4, Al2CO and Al4C3 is in the sequence of Al4CO4<Al2CO<Al4C3, while the interaction strength of AlCl with Al4CO4, Al2CO and Al4C3 is in the sequence of Al4CO4>Al2CO>Al4C3.
Key words:Ab initio; chloride reaction; carbothermic reduction; Al4C3; Al4CO4; Al2CO