Some New Views on the Principles of Magnetron Sputtering
来源期刊：材料保护2004年增刊第2期
论文作者：FANG Kai-ming TONG Hong-Hui ZHAO Jia-xue
关键词：corridor of magnetic force line; magnetic repelling force; horizontal magnetic confinement; critical density of electrons;
摘 要：In this paper, some common phenomena in magnetron sputtering are freshly analyzed and discussed on the basis of the motion of electrons in non-uniform orthogonal electric and magnetic fields. There exist magnetic confinements in three spatial dimensions on moving charged particles (including electrons) in this kind of non-uniform field. They are the longitudinal cycloidal motion, the horizontal simple harmonic-like motion (with varying amplitudes), and the vertical repelling action. The horizontal magnetic confinement in a mirror-like magnetic field keeps glow discharge lane completely parallel to the corridor of magnetic force lines, therefore only an effectively closed magnet array structure can form a relatively uniform and closed discharge lane. The main reasons for electrons' releasing from magnetic confinement are the vertical magnetic repelling force as well as a more and more weak confinement action in outer range etc. The dominant reasons for a comparatively low increase of substrate's temperature are that the density of bombarding electrons near the substrate is relatively low and their spatial distribution is relatively uniform (compared with that near the target surface). The erosion lane with an inverted Gauss's distribution shape on a magnetron sputtered target is due to that,with sputtering, the distribution width of the critical density of electrons shrinks continuously but the sputtering effect in the centerline of the corridor is always the most powerful.
FANG Kai-ming1，TONG Hong-Hui1，ZHAO Jia-xue1
(1.Southwestern Institute of Physics, Chengdu, 610041, Sichuan, P. R. China)
摘要:In this paper, some common phenomena in magnetron sputtering are freshly analyzed and discussed on the basis of the motion of electrons in non-uniform orthogonal electric and magnetic fields. There exist magnetic confinements in three spatial dimensions on moving charged particles (including electrons) in this kind of non-uniform field. They are the longitudinal cycloidal motion, the horizontal simple harmonic-like motion (with varying amplitudes), and the vertical repelling action. The horizontal magnetic confinement in a mirror-like magnetic field keeps glow discharge lane completely parallel to the corridor of magnetic force lines, therefore only an effectively closed magnet array structure can form a relatively uniform and closed discharge lane. The main reasons for electrons'' releasing from magnetic confinement are the vertical magnetic repelling force as well as a more and more weak confinement action in outer range etc. The dominant reasons for a comparatively low increase of substrate''s temperature are that the density of bombarding electrons near the substrate is relatively low and their spatial distribution is relatively uniform (compared with that near the target surface). The erosion lane with an inverted Gauss''s distribution shape on a magnetron sputtered target is due to that,with sputtering, the distribution width of the critical density of electrons shrinks continuously but the sputtering effect in the centerline of the corridor is always the most powerful.
关键词:corridor of magnetic force line; magnetic repelling force; horizontal magnetic confinement; critical density of electrons;
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