Carbon-Doped Titanium Oxide Films by DC Reactive Magnetron Sputtering Using CO₂ and O₂ as Reactive Gas

Dong Xie^1,2，Feng Wen³，Wenmao Yang⁴，Xueyuan Li⁴，Yongxiang Leng²，Guojiang Wan²，Hong Sun²，Nan Huang²

1. School of Physical Science and Technology,Southwest Jiaotong University2. Key Laboratory for Advanced Technologies of Materials,Ministry of Education,School of Materials Science and Engineering,Southwest Jiaotong University3. Key Laboratory of Tropical Biological Resource of Chinese Educational Ministry,School of Materials and Chemical Engineering,Hainan University4. Institute of Mechanical Manufacturing Technology,China Academy of Engineering Physics

摘 要：CO2and O2were employed as reactive gases to fabricate carbon-doped titanium oxide films using DC reactive magnetron sputtering.Microstructure,composition and optical band gap of the films were investigated by X-ray diffraction,X-ray photoelectron spectroscopy,and UV–visible spectrophotometer,respectively.The results showed that carbon-doped titanium monoxide films（C-TiO） with a carbon concentration of 5.8 at.% were obtained in an Ar/CO2mixed atmosphere.However,carbon-doped rutile and anatase（C-TiO2） with a carbon concentration of about 1.4 at.% were obtained in an Ar/CO2/O2mixed atmosphere.The optical band gaps of C-TiO and C-TiO2were about 2.6 and 2.9 eV,respectively.Both of them were narrower than that of pure TiO2films.Films with narrowed optical band gap energy are promising in promoting their photo-catalytic activity.

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