Enhanced Photocatalytic Activity of C-TiO2 Thin Films Prepared by Magnetron Sputtering and Post-carbon Ion Implantation
来源期刊：Journal Of Wuhan University Of Technology Materials Science Edition2015年第2期
论文作者：罗胜耘 YAN Bingxi CAO Minjian 沈杰
文章页码：245 - 249
摘 要：TiO2 thin films were fabricated by RF magnetron sputtering on titanium substrates and then implanted with different amounts of carbon. The microstructure, valence states and optical characteristics of each sample were investigated by X-ray diffraction, X-ray photoelectron spectroscopy and UV-vis diffuse reflection spectroscopy. Photoelectric property was evaluated under visible light using a xenon lamp as illuminant. The experimental results indicate that the implanting carbon concentration has a significant infl uence on film’s micro structure and element valence states. The dominant valence states of carbon vary as carbon content increases. Carbon ion implantation remarkably enhances the current density and photocatalytic capability of TiO2 thin films. The optimized implanting content is 9.83×1017 ion/cm2, which gives rise to a 150% increased photocurrent and degradation rate.
罗胜耘1,2，YAN Bingxi1，CAO Minjian1，沈杰1
1. Department of Materials Science, Fudan University2. College of Science, Guizhou Minzu University
摘 要：TiO2 thin films were fabricated by RF magnetron sputtering on titanium substrates and then implanted with different amounts of carbon. The microstructure, valence states and optical characteristics of each sample were investigated by X-ray diffraction, X-ray photoelectron spectroscopy and UV-vis diffuse reflection spectroscopy. Photoelectric property was evaluated under visible light using a xenon lamp as illuminant. The experimental results indicate that the implanting carbon concentration has a significant infl uence on film’s micro structure and element valence states. The dominant valence states of carbon vary as carbon content increases. Carbon ion implantation remarkably enhances the current density and photocatalytic capability of TiO2 thin films. The optimized implanting content is 9.83×1017 ion/cm2, which gives rise to a 150% increased photocurrent and degradation rate.
关键词：
