四乙基溴化铵硫酸盐水溶液中钴的电沉积

来源期刊:中国有色金属学报(英文版)2015年第6期

论文作者:Pinak PATNAIK Subrat Kumar PADHY Bankim Chandra TRIPATHY Indra Narayan BHATTACHARYA Raja Kishore PARAMGURU

文章页码:2047 - 2053

Key words:cobalt; tetra ethyl ammonium bromide (TEAB); electrodeposition; polarisation study; current efficiency; deposit morphology

摘    要:在硫酸盐水溶液中制备钴金属,研究四乙基溴化铵作为添加剂对其结构和形貌特征的影响。根据四乙基溴化铵的浓度变化(范围为1~50 mg/L)来评价其对电沉积金属钴的电流效率、能量消耗和电沉积质量的影响。当四乙基溴化铵的浓度为10 mg/L,且电流效率为99.6%、能量消耗为2.38 kW·h/kg时,可以得到平整且光亮的钴沉淀。X射线衍射分析表明,在钴电沉淀过程中,(100)面是晶体生长的择优生长面。扫描电镜结果表明,当四乙基溴化铵的浓度为10 mg/L时,可获得平整均匀的钴沉淀,而浓度超过10 mg/L时,沉淀质量恶化。循环伏安法研究表明,在电解槽中加入四乙基溴化铵时,阴极产生极化且阴极电流大大降低。XPS结果证实电沉积可获得高纯钴,且FTIR谱证明沉淀中没有与四乙基溴化铵结合的成分。

Abstract: The effect of tetra ethyl ammonium bromide (TEAB) as an additive on the structural, morphological characteristics of the cobalt metal produced from aqueous sulphate solutions was investigated. The concentration of TEAB was varied in a range of 1-50 mg/L to evaluate its effect on current efficiency, energy consumption and quality of electrodeposited cobalt metal. Smooth and bright deposits of cobalt were obtained at low concentration of TEAB (10 mg/L) maintaining a current efficiency of 99.6%, with a low energy consumption of 2.38 kW·h/kg. X-ray diffraction studies reveal that (100) plane is the most preferred plane of crystal growth during cobalt electrodeposition. Scanning electron micrographs indicate that smooth and uniform deposit of cobalt is obtained at 10 mg/L beyond which the deposit quality deteriorates. Cyclic voltammetric studies indicate that the presence of TEAB in the electrolytic bath polarizes the cathode and decreases the cathodic current considerably. XPS results confirm the electrodeposition of high pure cobalt with no sign of chemical bonding with TEAB as evident from the FTIR spectra.

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