FABRICATION OF HIGH-MELTING POINT METAL COATING

来源期刊：中国有色金属学报(英文版)1997年第4期

论文作者：Tang Bin Hu Xinfang Xu Kewei Wang Congzeng

文章页码：89 - 92

Key words：multiple hollow cathode ;sputtering target ;coating; high-melting point metal

Abstract: A new multiple hollow cathode sputtering target which has a simple configuration and a high sputtering rate was developed. Parameters of discharge and coating were studied. The results indicate that the current density and sputtering rate depend on the working pressure, target voltage and configuration. When H·D^-1 is 2～3, the target has an efficient sputtering rate. The optimum negative bias voltage is 200～300 V for Mo coating.