Substrate Temperature Dependent Properties of Cu Doped NiO Films Deposited by DC Reactive Magnetron Sputtering
来源期刊：JOURNAL OF MATERIALS SCIENCE TECHNOLOG2013年第7期
论文作者：Yarraguntla Ashok Kumar Reddy Akepati Sivasankar Reddy Pamanji Sreedhara Reddy
文章页码：647 - 651
摘 要：<正>The NiO—Cu composite films were deposited on a glass substrate at various substrate temperatures by DC reactive magnetron sputtering technique.The effect of substrate temperature on the structural,optical, morphological and electrical properties of the films was mainly investigated.X-ray diffraction studies revealed that when the substrate temperature increased to above 200℃,the preferred orientation tended to move to another preferred site from（220） to（111） and had a stable cubic structure.The optical transmittance and band gap values increased with increasing substrate temperature.From the morphological studies,it was observed that the grain size and root mean square roughness were increased with increasing substrate temperature.The electrical resistivity of the film decreased to 0.017Ωcm at high substrate temperature of 400℃.
Yarraguntla Ashok Kumar Reddy1，Akepati Sivasankar Reddy2，Pamanji Sreedhara Reddy1
1. Department of Physics,Sri Venkateswara University,Tirupathi 517502,India2. Division of Advanced Materials Engineering,Kongju National University,Budaedong,Cheonan City,South Korea
摘 要：<正>The NiO—Cu composite films were deposited on a glass substrate at various substrate temperatures by DC reactive magnetron sputtering technique.The effect of substrate temperature on the structural,optical, morphological and electrical properties of the films was mainly investigated.X-ray diffraction studies revealed that when the substrate temperature increased to above 200℃,the preferred orientation tended to move to another preferred site from（220） to（111） and had a stable cubic structure.The optical transmittance and band gap values increased with increasing substrate temperature.From the morphological studies,it was observed that the grain size and root mean square roughness were increased with increasing substrate temperature.The electrical resistivity of the film decreased to 0.017Ωcm at high substrate temperature of 400℃.
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