简介概要

MEVVA磁过滤等离子技术制备的Fe纳米颗粒薄膜结构

图书来源:二元合金相图及中间相晶体结构 二元合金相图及中间相晶体结构

作 者:唐仁政 田荣璋

出版时间:2009-05

定 价:320元

图书ISBN:978-7-81105-831-4

出版单位:中南大学出版社

详情信息展示

Determination of reduced Young s modulus of thin films using indentation test

Wuzhu YAN,Shifeng WEN,Jun LIU and Zhufeng YUE Department of Engineering Mechanics,Northwestern Polytechnical University,Xi an 710129,China

摘 要:The flat cylindrical indentation tests with different sizes of punch radius were investigated using finite element method(FEM) aimed to reveal the effect of punch size on the indentation behavior of the film/substrate system.Based on the FEM results analysis,two methods was proposed to separate film s reduced Young s modulus from a film/substrate system.The first method was based on a new weight function that quantifies film s and substrate s contributions to the overall mechanical properties of the film/substrate system in the flat cylindrical indentation test.The second method,a numerical approach,including fitting and extrapolation procedures was put forward.Both of the results from the two methods showed a reasonable agreement with the one input FE model.At last,the effect of maximum indentation depth and the surface micro-roughness of the thin film on the reduced Young s modulus of the film/substrate system were discussed.The methods proposed in the present study provide some new conceptions on evaluating other properties of thin films,e.g.creep,for which a flat-ended punch is also employed.

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