简介概要

THE STABILITY INVESTIGATION OF FERROELECTRIC SrBi2Ta2O9 THIN FILMS ANNEALED IN FORMING GAS

来源期刊:Acta Metallurgica Sinica2002年第1期

论文作者:A.D.Li N.B.Ming D.S.Wang Z.G.Liu D.Wu T.Yu A.Hu

Key words:ferroelectric; SrBi2 Ta2O9 thin film; stability; forming gas;

Abstract: The hysteresis loop changes of ferroelecric SrBi2 Ta2 O9 (SBT) thin films (330nm) vsthe temperature of forming gas (5%o hydrogen+95%o nitrogen) annealing were measuredwhen the annealing time was 1min and 10min. The selected annealing temperaturewas at 100℃, 200℃, 250℃, 300℃, 350℃, 400℃ and 4S0℃, respectively. Our resultsshowed that the ferroelectric properties were easily destroyed and the leakage currentchanged abruptly when the SBT thin films were in their ferroelectric phase (<270℃).The space charges at the grain boundary may take an important role in absorptionpolarity molecular hydrogen when the SBT thin films were in the ferroelectric phase.The oxygen recovery experiments were also performed and investigated in this work.

详情信息展示

THE STABILITY INVESTIGATION OF FERROELECTRIC SrBi2Ta2O9 THIN FILMS ANNEALED IN FORMING GAS

A.D.Li1,N.B.Ming1,D.S.Wang1,Z.G.Liu1,D.Wu1,T.Yu1,A.Hu1

(1.National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, China)

Abstract:The hysteresis loop changes of ferroelecric SrBi2 Ta2 O9 (SBT) thin films (330nm) vsthe temperature of forming gas (5%o hydrogen+95%o nitrogen) annealing were measuredwhen the annealing time was 1min and 10min. The selected annealing temperaturewas at 100℃, 200℃, 250℃, 300℃, 350℃, 400℃ and 4S0℃, respectively. Our resultsshowed that the ferroelectric properties were easily destroyed and the leakage currentchanged abruptly when the SBT thin films were in their ferroelectric phase (<270℃).The space charges at the grain boundary may take an important role in absorptionpolarity molecular hydrogen when the SBT thin films were in the ferroelectric phase.The oxygen recovery experiments were also performed and investigated in this work.

Key words:ferroelectric; SrBi2 Ta2O9 thin film; stability; forming gas;

【全文内容正在添加中】

<上一页 1 下一页 >

相关论文

  • 暂无!

相关知识点

  • 暂无!

有色金属在线官网  |   会议  |   在线投稿  |   购买纸书  |   科技图书馆

中南大学出版社 技术支持 版权声明   电话:0731-88830515 88830516   传真:0731-88710482   Email:administrator@cnnmol.com

互联网出版许可证:(署)网出证(京)字第342号   京ICP备17050991号-6      京公网安备11010802042557号