简介概要

Loose-fit graphitic encapsulation of silicon nanowire for one-dimensional Si anode design

来源期刊:JOURNAL OF MATERIALS SCIENCE TECHNOLOG2017年第10期

论文作者:Seh-Yoon Lim Sudong Chae Su-Ho Jung Yuhwan Hyeon Wonseok Jang Won-Sub Yoon Jae-Young Choi Dongmok Whang

文章页码:1120 - 1127

摘    要:Silicon nanowires(SiNWs) encapsulated with graphene-like carbon sheath(GS) having a void space in between(SiNW@V@GS) are demonstrated for the improved electrochemical performance of Si anode in lithium ion battery. The Si NW@V@GS structure was synthesized by a scalable fabrication method including four successive reactions: metal-catalyzed CVD growth of Si NWs, controlled thermal oxidation, and deposition of the graphitic layer, to form Si NW@SiO2@GS and additional chemical etching of sacrificial SiO2 layer between Si NWs and carbon sheath. During the synthetic process, the thickness of the void spacing was controlled by adjusting the oxidation-dependent process. The well-controlled void space and crystalline graphitic carbon sheath of the SiNW@V@GS structure enable good reversible capacity of1444 m Ahg-1 and cycling stability of 85% over 150 cycles.

详情信息展示

Loose-fit graphitic encapsulation of silicon nanowire for one-dimensional Si anode design

Seh-Yoon Lim1,Sudong Chae1,Su-Ho Jung1,Yuhwan Hyeon1,Wonseok Jang1,Won-Sub Yoon2,Jae-Young Choi1,Dongmok Whang1

1. School of Advanced Materials Science and Engineering, SKKU Advanced Institute of Nanotechnology, Sungkyunkwan University2. Department of Energy Science, Sungkyunkwan University

摘 要:Silicon nanowires(SiNWs) encapsulated with graphene-like carbon sheath(GS) having a void space in between(SiNW@V@GS) are demonstrated for the improved electrochemical performance of Si anode in lithium ion battery. The Si NW@V@GS structure was synthesized by a scalable fabrication method including four successive reactions: metal-catalyzed CVD growth of Si NWs, controlled thermal oxidation, and deposition of the graphitic layer, to form Si NW@SiO2@GS and additional chemical etching of sacrificial SiO2 layer between Si NWs and carbon sheath. During the synthetic process, the thickness of the void spacing was controlled by adjusting the oxidation-dependent process. The well-controlled void space and crystalline graphitic carbon sheath of the SiNW@V@GS structure enable good reversible capacity of1444 m Ahg-1 and cycling stability of 85% over 150 cycles.

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