Annealing Effects on Structural, Optical Properties and Laser-Induced Damage Threshold of MgF2 Thin Films
来源期刊:Acta Metallurgica Sinica2017年第1期
论文作者:Ting-Ting Tan Bang-Jie Liu Zhi-Hui Wu Zheng-Tang Liu
文章页码:73 - 78
摘 要:The chemical structures, optical properties and laser-induced damage thresholds of magnesium fluoride films annealed at different temperatures were investigated. The results showed that the stoichiometry of MgF2 film changed a little with the increase in annealing temperature. Analysis of the optical properties indicated that excellent antireflection behavior of the film in the range of 200–400 nm can be obtained by the samples coated with MgF2 film. The refractive index increased and the extinction coefficient decreased with increasing annealing temperature. Compared with the asdeposited films, the laser-induced damage threshold was improved after annealing process and decreased with the increase in annealing temperature, which was probably due to the denser film and more absorption centers under higher annealing temperature.
Ting-Ting Tan,Bang-Jie Liu,Zhi-Hui Wu,Zheng-Tang Liu
State Key Lab of Solidification Processing, School of Materials Science and Engineering, Northwestern Polytechnical University
摘 要:The chemical structures, optical properties and laser-induced damage thresholds of magnesium fluoride films annealed at different temperatures were investigated. The results showed that the stoichiometry of MgF2 film changed a little with the increase in annealing temperature. Analysis of the optical properties indicated that excellent antireflection behavior of the film in the range of 200–400 nm can be obtained by the samples coated with MgF2 film. The refractive index increased and the extinction coefficient decreased with increasing annealing temperature. Compared with the asdeposited films, the laser-induced damage threshold was improved after annealing process and decreased with the increase in annealing temperature, which was probably due to the denser film and more absorption centers under higher annealing temperature.
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