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Corrosion behaviors of Cr-Al-N coatings deposited by reactive magnetron sputtering DUO Shu-wang(多树旺)1, 2, ZHU Ming(朱 明)2, 3, LIU Ting-zhi(刘庭芝)1, LI Zhong-jun(李忠峻)1, WANG Peng(王... 110016, China Received 15 July 2007; accepted 10 September 2007 Abstract: CrN and Cr-Al-N coatings were deposited by reactive magnetron sputtering on the glass substrate, and their corrosion behavior......
STUDY ON Ni-Cr SYSTEM SOLAR SELECTIVE THIN FILMS PREPARED BY MAGNETRON REACTIVE SPUTTERING PROCESS H.Shen1,B.W.Wang1 (1.Guangzhou Institute of Energy Conversion,The Chinese Academy of Sciences... reactive sputtering; absorp-tance; emittance; [全文内容正在添加中] ......
OPTICAL CHARACTERIZATION OF TiO2 THIN FILM ON SILICON SUBSTRATE DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING D.Chen1,B.W.Wang2,H.Shen3,H.Q. Wang4,D.C. Ba5,L.S.Wen6 (1.Material and Science... reactive magnetron sputtering process from Ti target. The reflectivity of the films was measured by UV-3101PC, and the index of refraction (n) and extinction coefficient (k) were measured by n & k......
CrN, TiN, TiAlN coatings and nanolayered TiAlN/CrN multilayer coatings prepared by reactive direct current magnetron sputtering [J]. Thin Solid Films, 2006, 514: 204-211.  ... Preparation of TiAlN/ZrN and TiCrN/ZrN multilayers by RF magnetron sputtering Jong-Kook LEE1, 2, Gwon-Seung YANG1 1. Department of Advanced Materials Engineering, Chosun University, Gwangju......
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Carbon-Doped Titanium Oxide Films by DC Reactive Magnetron Sputtering Using CO2 and O2 as Reactive GasDong Xie1,2,Feng Wen3,Wenmao Yang4,Xueyuan Li4,Yongxiang Leng2,Guojiang Wan2,Hong Sun2,Nan... DC reactive magnetron sputtering.Microstructure,composition and optical band gap of the films were investigated by X-ray diffraction,X-ray photoelectron spectroscopy,and UV–visible spectrophotometer......
were deposited on the slides by reactive magnetron sputtering in this experiment and the photocatalytic degradation characteristics and other pertinent features of the films were studied.2 Experimental 2.1 Preparation of amorphous TiO2-W films Amorphous TiO2-W films were deposited by the co-sputtering of reactive direct current(DC) and radio-frequency(RF) magnetron sputtering......
Influence of oxygen partial pressure on properties of N-doped ZnO films deposited by magnetron sputtering WANG Jin-zhong(王金忠)1, 2, E. ElANGOVAN2, N. FRANCO3, A. ALVESE3, A. REGO4, R...) are highly resistive (> 105 W?cm) Key words: ZnO; oxygen partial pressure; magnetron sputtering; transmittance 1 Introduction Zinc oxide (ZnO) is a promising candidate for UV or blue light......
; Abstract: ZnO thin films were prepared by direct current(DC) reactive magnetron sputtering under different oxygen partial pressures... and experimental approaches. In this work, ZnO thin films were prepared at different oxygen partial pressures by direct current(DC) reactive magnetron sputtering and then annealed in vacuum......
; Abstract: Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal... properties of Ta2O5 thin films prepared by DC reactive magnetron sputtering is helpful to understanding and optimizing the fabrication processing. In this work, Ta2O5 thin films were prepared by DC......