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Influence of nitrogen gas on structure and properties of DLC films prepared by XeCl pulsed laser deposition CHEN Yu-qiang(陈玉强)1,PENG Hong-yan(彭鸿雁)1, 3, ZHAO Li-xin(赵立新)2, LI Min-jun(李敏君)1 XIA Yi... carbon (DLC) films were prepared by PLD process using 308 nm(XeCl) laser beam with high power (500 W) and high frequency(300 Hz). The effects of nitrogen pressure on the structure and properties......
STUDY ON COMPOSITION, MICROSTRUCTURE AND HARDNESS OF DLC FILMS BY VCAD S.S.Lin1,Z.H.Yuan1,H.J.Hou1,L.Chen2,Z.Y.Liu2,W.Q.Qiu2,D.C.Zeng2 (1.Guangzhou Research Institute of Non-Ferrous Metals, Guangzhou 510651, Chiua;2.Institute of Materials Science & Technology, College of Mechanical Engineering, South China University of Technology, Guangzhou 510640, China) Abstract:DLC super-hard films have......
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. 关键词:铝合金;PEO陶瓷层;DLC膜;承载层;有限元;应力场 中图分类号:TG174.4 文献标志码:A Effects of PEO ceramic layer on load-bearing characteristics of DLC films on aluminum substrate GAO Fang-yuan1, 2... and interfaces can be got, thereby the friction and wear properties of the DLC film on aluminum substrate are improved. Key words: aluminum alloy; PEO ceramic layer; DLC films; bearer layer; finite......
多组分缓冲层W梯度掺杂DLC复合薄膜研究杨义勇1,彭志坚1,付志强1,邬苏东1,陈新春1,王成彪1(1.北京市地质大学 工程技术学院)摘 要:用离子束辅助非平衡中频磁控溅射技术,在Si,高速钢或不锈钢基体上分别沉积得到了具有多组分过渡金属层缓冲的W梯度掺杂类金刚石碳(DLC)膜,研究了W靶电流对DLC膜组成,结构....关键词:复合镀膜技术; DLC薄膜; W掺杂; 摩擦学性能......
性偏压; 优质DLC膜; 磁过滤等离子体; 硬度 中图分类号: TG175 文献标识码: A Effect of substrate bias on high quality DLC films deposited by filtered cathode arc plasma YAN Peng-xun, LI Xiao-chun, LI Chun, LI Xin, XU Jian-wei (Institute of Plasma & Metal Materials, Lanzhou University, Lanzhou 730000, China) Abstract: High quality DLC films were fabricated on the single crystal Si substrate by using filtered cathode......
脉冲偏压对等离子体沉积DLC膜化学结构的影响 夏立芳1,孙立海2,孙跃1,孙明仁1,马欣新1 (1.哈尔滨工业大学材料科学与工程学院,黑龙江,哈尔滨,150001;2.哈尔滨机械设备进出口公司,黑龙江,哈尔滨,150015) 摘要:以乙炔为气源,用等离子体基脉冲偏压沉积(plasma based pulsd bias deposition缩写PBPBD)技术进行了不同负脉冲偏压条件下制备DLC膜的试验.通过X射线光电子谱(XPS),激光喇曼光谱[Raman]以及电阻分析方法考察了负脉冲偏压幅值对DLC膜化学结构的影响.结果表明由-50 kV到-10 kV随负脉冲偏压降低,DLC膜中SP3键分数单调增加,但当脉冲偏压为0时形成高电阻的类聚合物膜,说明荷能离子的轰击作用是形成DLC化学结构的必要条件.键角混乱度和SP2簇团尺寸与脉冲偏压之间不具有单调关系,在中等幅值负脉冲偏压条件下,键......
Ti合金化DLC膜的结构和力学性能 陆小华1,江晓红1,金元生2 (1.南京工业大学化工学院,南京,210009;2.清华大学摩擦学国家重点实验室,北京,100084) 摘要:在一台y B H ИП A-1型双激发源等离子弧薄膜沉积装置上制取Ti合金化DLC膜,用纳米硬度计,显微硬度计,原子力显微镜以及X射线衍射仪和光电子能谱仪等手段对薄膜的力学性能和结构进行了分析和测定.摩擦磨损试验在一台球-盘滑动磨损试验机上进行.比较了不同钛合金化程度的DLC膜及热处理前后的性能变化.结果表明,薄膜的力学性能与Ti含量有非单值关系,但摩擦系数随Ti含量增加而升高;热处理后薄膜显微硬度显著升高的原因是生成了碳化钛硬化相. 关键词:DLC膜; 薄膜沉积; 性能分析; [全文内容正在添加中] ......
AFM Study on Reliability of Nanoscale DLC Films Deposited by ECR-MPCVD ZHU Shi-gen1,DING Jian-ning2,ZHU Shou-xing1 (1.School of Mechanical Engineering, Donghua University, Shanghai 200051, China... the reliability of diamond-like carbon (DLC) films, deposited by electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD). The predictors for film reliability were given......
×1017 N+/cm2. Then, the specimen surface implanted with N-ion with the concentration of 1×1017 and 13×1017 N+/cm2 was plating DLC films. The DLC films plating process like this: at first, plant Cr... and DLC film, at last plant DLC films in the CrN surface. The silicon nitride (Si3N4) counter-body (the sphere specimen) was a bearing sphere (AISI 52100), 10 mm in diameter. The hardness of the Si3N4......