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J. Cent. South Univ. Technol. (2008) 15(s1): 197-201 DOI: 10.1007/s11771-008-345-8 Fabrication of micro carbon pillar by laser-induced chemical vapor deposition ZHOU Jian(周 健)1, LUO Yin-she(罗迎社... power from 0.5 W to 4.5 W and the pressure of the precursor gas from 225×133.3 Pa to 680×133.3 Pa, the experiments of laser induced chemical vapor deposition were proceeded for fabrication of micro......
J. Cent. South Univ. (2016) 23: 44-51 DOI: 10.1007/s11771-016-3047-7 Numerical simulation of chemical vapor deposition reaction in polysilicon reduction furnace XIA Xiao-xia(夏小霞)1, 2, WANG Zhi-qi(王志... Central South University Press and Springer-Verlag Berlin Heidelberg 2016 Abstract: Three-dimensional model of chemical vapor deposition reaction in polysilicon reduction furnace was established......
was tightly deposited by hot-filament chemical vapor deposition (HF-CVD). The nucleation and growth of diamond were investigated with micro-Raman spectroscope and field emission scanning electron microscope... simulation was conducted to understand the thermal management properties of prepared diamond/Cu microchannel heat sink.Key words:chemical vapor deposition; microchannel; nanoseeding; Ti interlayer; Cu......
Trans. Nonferrous Met. Soc. China 22(2012) s712-s716 Effective parameters on diameter of carbon nanotubes by plasma enhanced chemical vapor deposition Kang Young JEONG1, Hyun Kyung JUNG2, Hyung Woo... enhanced chemical vapor deposition (PECVD) were presented. Among lots of influential parameters, the effects of the catalytic film thickness and the pretreatment plasma power on the growth of CNTs were......
chemical vapor infiltration(CVI) technology with propane (C3H6) as the carbon precursor gas and nitrogen (N2) as the carrier gas. The chemical process of deposition of pyrolytic carbon was deduced... and reactivity in the chemical vapor deposition of carbon [J]. Carbon, 1998, 36: 1623-1632. [7] DELHAES P. Chemical vapor deposition and infiltration processes of carbon materials [J]. Carbon, 2002......
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Trans. Nonferrous Met. Soc. China 22(2012) s722-s728 Microstructure evolution and mechanical properties of Ti-B-N coatings deposited by plasma-enhanced chemical vapor deposition Jung Ho SHIN1,2... wafer by plasma-enhanced chemical vapor deposition (PECVD) technique using a gaseous mixture of TiCl4, BCl3, H2, N2, and Ar. By virtue of X-ray diffraction analysis, X-ray photoelectron spectroscopy......
Growth of straight carbon nanotubes by simple thermal chemical vapor deposition ZOU Xiao-ping(邹小平) 1,2,3,4, H. ABE 3, T. SHIMIZU 3, A. ANDO 5, H. TOKUMOTO 3,6, ZHU Shen-ming(朱申敏)4, ZHOU Hao-shen(周... April 2006; accepted 25 April 2006 Abstract: Straight carbon nanotubes (CNTs) were achieved by simple thermal chemical vapor deposition(STCVD) catalyzed by Mo-Fe alloy catalyst on silica supporting......
Structural and optical properties of tellurium films obtained by chemical vapor deposition(CVD) MA Yu-tian(马玉天)1, 2,GONG Zhu-Qing(龚竹青)1, XU Wei-Hong(徐卫红)1, HUANG Jian(黄 坚)1 1. School...; Abstract: Tellurium thin films were prepared by the chemical vapor deposition method......
)Abstract:InGaAs high electron mobility transistors (HEMTs) on InP substrate with very good device performance have been grown by mental organic chemical vapor deposition (MOCVD). room temperature Hall... encouraging toward manufacturing InP-based HEMT by MOCVD.Key words:metamorphic device; mental organic chemical vapor deposition; high electron mobility transistors; InP substrate; InGaAs......