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Preparation of TiAlN/ZrN and TiCrN/ZrN multilayers by RF magnetron sputtering Jong-Kook LEE1, 2, Gwon-Seung YANG1 1. Department of Advanced Materials Engineering, Chosun University, Gwangju... prepared by RF magnetron sputtering, and their microstructural evolution and corrosion resistance during heat treatment were investigated. The TiAlN/ZrN and TiCrN/ZrN multilayer coatings are degraded......
THE EFFECTS OF SPUTTERING POWER ON STRUCTURE AND ELECTRICAL PROPERTIES OF Cu FILMS L.Q.Pan1,P.Wu1,H.Qiu1,Y.Tian1,F.P.Wang1 (1.Beijing Keda-Tianyu Microelectronic Material Technology Development Co. Ltd.,Beijing 100083,China) Abstract:Cu films with thickness of about 500nm were deposited on glass substrates without heat-ing by DC magnetron sputtering in pure Ar gas of 1.0Pa. The sputtering......
Influence of sputtering parameters on microstructure and mechanical properties of GeSbTe films FU Yong-zhong(付永忠) Micro/Nano Science and Technology Center, Jiangsu University, Zhenjiang 212013...; Abstract: GeSb2Te4 films were deposited on Si substrates by RF magnetron sputtering, and the effects of sputtering power on the surface topography and anti-compression......
Corrosion behaviors of Cr-Al-N coatings deposited by reactive magnetron sputtering DUO Shu-wang(多树旺)1, 2, ZHU Ming(朱 明)2, 3, LIU Ting-zhi(刘庭芝)1, LI Zhong-jun(李忠峻)1, WANG Peng(王... 110016, China Received 15 July 2007; accepted 10 September 2007 Abstract: CrN and Cr-Al-N coatings were deposited by reactive magnetron sputtering on the glass substrate, and their corrosion behavior......
Silver-palladium alloy deposited by DC magnetron sputtering method as lubricant for high temperature application Jung-Dae KWON1, Sung-Hun LEE1, Koo-Hyun LEE1, Jong-Joo RHA1, Kee-Seok NAM1, Sang...(DC) magnetron sputtering system. The thickness and composition of the Ag-Pd alloy film have effect on the friction coefficient, which was determined using axial force measurement. A 500 nm-thick Ag-Pd......
GROWTH OF β-SiC BY rf SPUTTERING ON SILICON SUBSTRATES E.Q.Xie1,S.Lin1,Q.Wen1,C.C.Ning1,Z.W.Ma1 (1.Department of Physics,Lanzhou University,Lanzhou 730000,China) Abstract:Rf sputtering in an Ar... goodquality of both crystalline and SiC /Si interface. Key words:SiC. sputtering. IR. XRD; [全文内容正在添加中] ......
Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, China) Abstract: Ternary Zn1-xCdxO alloying films were deposited on silicon substrates by a reactive magnetron sputtering method... and that ZnCdO grains with c-axis preferred orientation nucleate directly on substrate surface. Key words: ZnCdO; microstructure; sputtering CLC number: TG304 Document code: A 1 INTRODUCTION......
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J. Cent. South Univ. Technol. (2008) 15: 449-453 DOI: 10.1007/s11771-008-0084-x Photoluminescence properties of ZnO thin films prepared by DC magnetron sputtering YANG Bing-chu(杨兵初), LIU Xiao-yan...; Abstract: ZnO thin films were prepared by direct current(DC) reactive magnetron sputtering under different oxygen partial pressures......
Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta2O5 thin films ZHOU Ji-cheng(周继承), LUO Di-tian(罗迪恬), LI You-zhen(李幼真), LIU Zheng(刘 正) School of Physics...; Abstract: Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal......