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Preparation of Sn nano-film by direct current magnetron sputtering and its performance as anode of lithium ion battery ZHAO Ling-zhi(赵灵智)1, 2, HU She-jun(胡社军)2, 3, LI Wei-shan(李伟善)2, HOU Xian... thin film on Cu foil substrate as the anode of lithium ion battery was prepared by direct current magnetron sputtering(DCMS). The surface morphology, composition and thickness and the electrochemical......
EFFECT OF Ar PRESSURE ON STRUCTURAL AND ELECTRICAL PROPERTIES OF Cu FILMS DEPOSITED ON GLASS BY DC MAGNETRON SPUTTERING L.Q.Pan1,F.P.WANG1,P.Wu1,H.Qiu1,Y.Tian1 (1.Department of Physics, University... of 630-1300nm were deposited on glass substrates withoutheating by DC magnetron sputtering in pure Ar gas. Ar pressure was controlled to0.5, 1.0 and 1.5Pa respectively. The target voltage was fixed at 500V......
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类号:O 484 文献标识码:A Effects of sputtering pressure on electrical and optical properties of transparent conducting ZnO thin film ZHOU Ji-cheng, LI Li (School...) magnetron sputtering method. The influences of pressure on the surface morphology, the electrical and optical properties were studied by AFM, XRD, UV-Vis spectrophoto meter and four-probe method......
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反应磁控溅射法高速低温沉积锐钛矿相TiO2薄膜的结构与光学性能李铸国1,三宅正司2(1.上海市上海交通大学材料科学与工程学院上海激光制造与材料改性重点实验室2.近畿大学,大阪 5778502,日本)摘 要:采用诱导型耦合等离子体辅助直流磁控溅射法在石英玻璃片上反应沉积TiO2薄膜,通过X射线衍射(XRD),透射电子显微镜(TEM)和紫外可见光谱(UV-Vis)对薄膜特性进行表征.结果表明,叠加诱导型耦合等离子体和局部富氧增加了等离子体的反应活性,在金属溅射模式和低于200℃的沉积条件下,制备了高质量的锐钛矿相T......
Trans. Nonferrous Met. Soc. China 24(2014) 2559-2565 Microstructures of TiN, TiAlN and TiAlVN coatings on AISI M2 steel deposited by magnetron reactive sputtering Cui-feng WANG1, Shih-fu OU2, Shi... and TiAlVN coatings were deposited on AISI M2 high-speed steels by magnetron reactive sputtering. The microstructures of all the coatings were characterized by X-ray diffraction (XRD), scanning......
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