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-target magnetron sputtering system in an Ar-N 2 gas mixture. The Ti-Si-N films were investigated by characterization techniques such as X-ray diffraction (XRD), atomic force microscope (AFM), electron... that magnetron sputtering is a promising method to deposit hard films onto soft substrate.关键词:......
Fabrication of Cr coating on AZ31 magnesium alloy by magnetron sputtering WU Guo-song(吴国松)1, WANG Ai-ying(汪爱英)1, DING Ke-jian(丁克俭)2, XU Cai-yun(徐采云)1, DAI Wei(代 伟)1, XU Ai-jiao(徐...; Abstract: Chromium-plating is considered an effective method to improve surface properties of metal materials. Magnetron sputtering was applied......
Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering XU Jun1,LI Xin1,DONG Chuang1,DENG Xin-lu1,GAO Peng1,DING Wan-yu1 (1.State Key Lab. for Materials...-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier......
OPTICAL CHARACTERIZATION OF TiO2 THIN FILM ON SILICON SUBSTRATE DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING D.Chen1,B.W.Wang2,H.Shen3,H.Q. Wang4,D.C. Ba5,L.S.Wen6 (1.Material and Science... reactive magnetron sputtering process from Ti target. The reflectivity of the films was measured by UV-3101PC, and the index of refraction (n) and extinction coefficient (k) were measured by n & k......
Preparation of Large Area Double Sided YBCO Thin Films by DC Magneton Sputtering Wang Xiaoping1,Xie Bowei1,WANG Peiwen1,Li Tao1,Gu Hongwei1 (1.Superconducting Materials Research Center, General Research Institute for Non-Ferrous Metals, Beijing 100088, China) Abstract:Tc, Jc and Rs properties of large area double sided YBCO thin films deposited on LaAlO3 substrates by direct current sputtering......
Photocatalytic degradation characteristic of amorphous TiO2-W thin films deposited by magnetron sputtering HUANG Jia-mu(黄佳木), LI Yue-xia(李月霞), ZHAO Guo-dong(赵国栋), CAI Xiao-ping(蔡小平) College... magnetron sputtering. Properties of the films were analyzed via AFM, XRD, XPS, STS, UV-Vis and ellipse polarization apparatus. The results show that TiO2-W films are amorphous. The AFM map reveals......
Applications of Cr-Based Metal Nitride Hard Coatings Using Multi-Magnetron Sputtering Sources and Elemental Metal Targets D.G. Teer1,Eric Wiemann2,Shicai Yang1 (1.Teer Coatings Ltd., West Stone...) 摘要:Cr-based nitride hard coatings were produced by multi-magnetron sputtering sources using elemental metal materials. Cr, Ti, Mo, V, Al, and Y target materials were used for the metal sources......
Dependence of characteristics of LaB6 films on DC magnetron sputtering power XU Jing(徐 静)1, 2, MIN Guang-hui(闵光辉)1, HU Li-jie(胡立杰)1, ZHAO Xiao-hua(赵晓华)1, YU Hua-shun(于化顺)1 1. School of Materials...: Lanthanum hexaboride(LaB6) thin films were deposited on glass substrate by DC magnetron sputtering technology, and the AFM, XRD and scratch tests were used to characterize the deposited films. Influences......
Article ID: 1003-6326(2005)06-1214-05 Growth characteristics of MoS2 coatings prepared by unbalanced bipolar DC magnetron sputtering WANG Ji-hui(王吉会)1, XIA Yang(夏 扬)1, E.Wieers2..., Belgium; 3. Department of MTM, Katholieke Universiteit Leuven, B-3001 Leuven, Belgium) Abstract: MoS2 coatings were prepared by unbalanced bipolar DC magnetron sputtering under different argon pressures......
Preparation of YBa2Cu3O7-x Superconductor Film by Ion Beam Sputtering胡倾宇,闻立时,乔桂文,庄育智摘 要:<正> Since the discovery of high Tc super-conductor, much... for mi-croelectronic application are preparedby PVD method, such as electron beamevaporation, pulsed laser evaporation andmagnetron sputtering. In this paper, thepreliminary results of ion beam......