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reactive magnetron sputtering process from Ti target. The reflectivity of the films was measured by UV-3101PC, and the index of refraction (n) and extinction coefficient (k) were measured by n & k...OPTICAL CHARACTERIZATION OF TiO2 THIN FILM ON SILICON SUBSTRATE DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING D.Chen1,B.W.Wang2,H.Shen3,H.Q. Wang4,D.C. Ba5,L.S.Wen6 (1.Material and Science......
Maneuvering target track-before-detect viamultiple-model Bernoulli particle filterZHAN Rong-hui(占荣辉), LIU Sheng-qi(刘盛启), HU Jie-min(胡杰民), ZHANG Jun(张军)(Science and Technology on Automatic Target Recognition Laboratory,National University of Defense Technology, Changsha 410073, China)Abstract:Target tracking using non-threshold raw data with low signal-to-noise ratio is a very difficult task......
) 摘要:Cr-based nitride hard coatings were produced by multi-magnetron sputtering sources using elemental metal materials. Cr, Ti, Mo, V, Al, and Y target materials were used for the metal sources...Applications of Cr-Based Metal Nitride Hard Coatings Using Multi-Magnetron Sputtering Sources and Elemental Metal Targets D.G. Teer1,Eric Wiemann2,Shicai Yang1 (1.Teer Coatings Ltd., West Stone......
-efficient target tracking protocol in wireless sensor networks BHUIYAN M. Z. A., WANG Guo-jun(王国军), ZHANG Li(张力), PENG Yong(彭勇) School of Information Science and Engineering, Central South University...; Abstract: A prediction based energy-efficient target tracking protocol in wireless sensor networks (PET) was proposed......
Structure and Properties of TiO2-CeO2 Films Deposited on Soda-Lime Silicate Glass Substrates by R.F.Magnetron Sputtering Zhao Qingnan1,Ni Jiamiao1,Zhang Naizhi1,Jiang Hong2,Wang Guirong2,ZHAO... 471009, China) Abstract:TiO2-CeO2 films were deposited on soda-lime glass substrates at different ratio of O2 to Ar (0.10, 0.15,0.20) by R. F. magnetron sputtering. The structure, surface composition, UV......
studied and discussed. The purpose of the study was to investigate the correlation between the characteristic and the sputtering power. 2 Experimental The pellet LaB6 target with thickness of 3 mm... of the sputtering power, the scattering of target atoms by argon is increased, resulting in temperature rising. This corresponds to heat treatment on the film. The treatment is continuous on the formation......
, WANG Chuan-jun. Application and development trend of NiPt alloy sputtering target in semiconductor manufacturing[J]. Precious Metals, 2016, 37(3): 87-92. [5] 杨长胜, 程海峰, 唐耿平, 李效东, 楚增永, 周永江. 磁控溅射铁磁性靶材的研究进展... for Comprehensive Utilization of Platinum Metals, Kunming 650106, China; 2. Kunming Institute of Precious Metals, Kunming 650106, China) Abstract: Nickel-platinum (NiPt) alloy sputtering target was used......
for the effectiveness of lubricant. Since MoS2 target is not a good conductor, MoS2 coatings are commonly prepared by reactive DC or RF magnetron sputtering and IBAD techniques[6-11]. MoS2 coatings deposited... be prepared. 2 EXPERIMENTAL 2.1 Preparation of coatings A bipolar-pulse unbalanced DC magnetron sputtering system was used in this work for the deposition of MoS2 coatings[16, 17]. A MoS2 target......
,and Hall effect.The structures of the films were either amorphous or nanocrystalline depending on sputtering parameters including deposition time,target power,chamber pressure,and the target–substrate...Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering ParametersFa-Yu Wu1,Jian-Wei Li1,Yi Qi2,Wu-Tong Ding3,Yuan-Yuan Guo1,Yan-Wen Zhou11. Laser Advanced......
power generator (13.6 MHz) from Advanced Energy (Model: RFX 2500) was used for sputtering the target. The thickness of the films was measured using a surface profilometer (Dektak3) with an accuracy... Influence of oxygen partial pressure on properties of N-doped ZnO films deposited by magnetron sputtering WANG Jin-zhong(王金忠)1, 2, E. ElANGOVAN2, N. FRANCO3, A. ALVESE3, A. REGO4, R......