共搜索到2790条信息,每页显示10条信息,共279页。用时:0小时0分0秒406毫秒
) magnetron sputtering method. The influences of pressure on the surface morphology, the electrical and optical properties were studied by AFM, XRD, UV-Vis spectrophoto meter and four-probe method... ℃ for 300 s under N2 ambient, the lowest resistivity is 10?2 Ω·cm. Key words: radio-frequency magnetron sputtering; ZnO thin film; sputtering pressure; transparent conducting thin film  ......
. Study on deposition rate of AlN thin films using reactive magnetron sputtering [J]. Rare Metal Materials and Engineering, 2002, 31(3): 209-212. (in Chinese) [8] FU Yong-zhong, DING Jian-ning, YANG Ji...; Abstract: GeSb2Te4 films were deposited on Si substrates by RF magnetron sputtering, and the effects of sputtering power on the surface topography and anti-compression......
PREPARATION AND SURFACE CHARACTERIZATION OF TiO2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD J.X.Zhang1,H.Shen2,L.S.Yin3 (1.Department of Physics,Zhongshan University,Guangzhou 510275,China... deposited on glass substrates by magnetron sputtering method,then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thinfilms on glass substrates were obtained. The structure......
and Coatings Technology, 2002, 153: 25-30. [8] KITTY W L, CHEN Y H, CHUNG Y W. Hardness, internal stress and thermal stability of TiB2/TiC multilayer coatings synthesized by magnetron sputtering... Orthogonal experiment and microstructure analysis on TiC-TiB2 multi-phase ceramic coating prepared by SHS reactive spraying DU Xin-kang(杜心康)1, 2, WANG Jian-jiang(王建江)1, WANG Tian-min(王天民)2, LIU......
Fabrication of Cr coating on AZ31 magnesium alloy by magnetron sputtering WU Guo-song(吴国松)1, WANG Ai-ying(汪爱英)1, DING Ke-jian(丁克俭)2, XU Cai-yun(徐采云)1, DAI Wei(代 伟)1, XU Ai-jiao(徐...; Abstract: Chromium-plating is considered an effective method to improve surface properties of metal materials. Magnetron sputtering was applied......
Materials Science and Engineering of Ministry of Education, Changsha 410083,China) Abstract: VOx thin films were produced on the substrates of glass by reactive magnetron sputtering. The phases... decreases from 55%?65% to 45%?55% and the size of grains increases from about 200 nm to 400 nm. Key words: vanadium dioxides; reactive magnetron sputtering; infrared transmittance  ......
sputtering power is 400 W. Key words: titanium dioxide; DC reactive magnetron sputtering; sputtering power; antireflection; optical property 由于硅的折射系数(n~3.5)[1]与空气的折射系数相差很大,光波在界面处的反射成为影响太阳能电池效率的重要因素,因此,必... reactive magnetron sputtering[J]. Surface and Coatings Technology, 2009, 203(23): 3661-3668. [12] W?tje K, Ebbecke J, Thorwarth G, et al. Plasma deposition of piezoelectric ZnO layers by rf sputtering, Sol......
Dependence of characteristics of LaB6 films on DC magnetron sputtering power XU Jing(徐 静)1, 2, MIN Guang-hui(闵光辉)1, HU Li-jie(胡立杰)1, ZHAO Xiao-hua(赵晓华)1, YU Hua-shun(于化顺)1 1. School of Materials...: Lanthanum hexaboride(LaB6) thin films were deposited on glass substrate by DC magnetron sputtering technology, and the AFM, XRD and scratch tests were used to characterize the deposited films. Influences......
......
of indium tin oxide (ITO) films prepared by r.f. reactive magnetron sputtering at different pressures [J]. Thin Solid Films, 1997, 303: 151-155. [11] HAMBERG I, GRANQVIST C G. Evaporated Sn-doped... Effect of process parameters on electrical, optical properties of IZO films produced by inclination opposite target type DC magnetron sputtering Do-Hoon SHIN1, Yun-Hae KIM2, Joong-Won......