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of 9.3. The working pressure of the chamber was maintained at 0.8 Pa. Pre-sputtering was performed by plasma for 15 min to clean the target surface. The deposition duration for growing the films... (threshold energy necessary to bombard the target), and scattering within the plasma. The sputtering yield is the number of atoms ejected from the target per incident ion, and is dependent on not only......
by magnetron sputtering deposition process in the argon (Ar) atmosphere. The depositing system was configured three magnetron target positions which focused on a substrate seat. High pure graphite target... Trans. Nonferrous Met. Soc. China 22(2012) 1372-1380 Influence of Ti target current on microstructure and properties of Ti-doped graphite-like carbon films WANG Yong-xin1, 2, WANG Li-ping1, XUE......
that when the distance between target and substrate was 72 mm,the thin film thickness was 120 nm,and the sputtering power,sputtering pressure and sputtering time was 75 W,0.5 Pa and 613 s,respectively...Sputtering Preparation and Magneto-optical Properties of GdTbFeCo Thin Films黄致新College of Physical Science and Technology,Cental China Normal University摘 要: J. Cent. South Univ. (2021) 28: 747-759 DOI: https://doi.org/10.1007/s11771-021-4642-9 Moving target detection based on improved ghost suppression and adaptive visual background extraction LIU Ling... target detection; ghost suppression; adaptive visual background extraction Cite this article as: LIU Ling, CHAI Guo-hua, QU Zhong. Moving target detection based on improved ghost suppression......Moving target detection based on improved ghost suppression and adaptive visual background extraction
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来源: 《中南大学学报(英文版)2021年第3期》——瞿中 刘玲 柴国华
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with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under N2/Ar atmosphere. By varying the sputtering current of the AlSi target in the range of 0-2.5... combining an HIPIMS (Hauzer Techno Coating BV) and a DC pulse sputtering system as schematically shown in Fig. 1. The experiments were performed using an HIPIMS with Cr target and a pulse DC with AlSi target......
of Al-Zr alloys. 2 Experimental 2.1 Fabrication of Al-Zr foils by physical vapour deposition Al-Zr films were deposited in a magnetron sputtering unit with DC power supply. A rectangular target..., the target power was kept constant at 1 kW and argon was used as sputtering gas (pressure: 0.7 Pa). In order to reach a thickness of 15 μm the process ran for 105 min. The substrate holder was located......
A MoLC+MoM-based G0 distribution parameter estimation method with application to synthetic aperture radar target detectionZHU Zheng-wei(朱正为)1, 2, 3, ZHOU Jian-jiang(周建江)2, GUO Yu-ying(郭玉英)1(1. School...:The accuracy of background clutter model is a key factor which determines the performance of a constant false alarm rate (CFAR) target detection method. G0 distribution is one of the optimal statistic models......
基于Matlab/xPC Target的实时仿真系统研究王超,王仕成,刘志国摘 要:利用Matlab RTW和xPC Target提供的实时仿真功能,可以完成某些实物在回路中的仿真.采用该种方式与传统方式相比,具有系统组建方便,成本低,开发周期短等特点.主要讨论了其实现方式和开发流程,并将其应用到弹载计算机仿真评估系统的设计中.关键词:实时仿真;仿真系统;xPC Target;RTW;......