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EFFECT OF Ar PRESSURE ON STRUCTURAL AND ELECTRICAL PROPERTIES OF Cu FILMS DEPOSITED ON GLASS BY DC MAGNETRON SPUTTERING L.Q.Pan1,F.P.WANG1,P.Wu1,H.Qiu1,Y.Tian1 (1.Department of Physics, University... of 630-1300nm were deposited on glass substrates withoutheating by DC magnetron sputtering in pure Ar gas. Ar pressure was controlled to0.5, 1.0 and 1.5Pa respectively. The target voltage was fixed at 500V......
Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering XU Jun1,LI Xin1,DONG Chuang1,DENG Xin-lu1,GAO Peng1,DING Wan-yu1 (1.State Key Lab. for Materials...-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier......
Tungsten Doped Indium Oxide Thin Films Deposited at Room Temperature by Radio Frequency Magnetron SputteringJiaojiao Pan,Wenwen Wang,Dongqi Wu,Qiang Fu,Ding MaDepartment of Physics,Beihang University摘 要:Tungsten doped indium oxide(IWO) thin films were deposited on glass substrate at room temperature by radio frequency reactive magnetron......
magnetron sputtering on glass and alumina substrates for the application in energetic nano-multilayers.The structural and thermal properties of the films were investigated with the volume ratio...Fabrication and characterization of NiO films for energetic nano-multilayers by direct current reactive sputteringYi-Chao Yan,Wei Shi,Hong-Chuan Jiang,Jie Xiong,Wan-Li ZhangState Key Laboratory......
A, MATTEW A. Structure, mechanical and tribological properties of nitrogen-containing chromium coatings prepared by reactive magnetron sputtering [J]. Surface and Coating Technology, 1999, 115: 222-229. [7..., SANJINES R, F. High-temperature oxidation resistance of Cr1-xAlxN thin films deposited by reactive magnetron sputtering [J]. Surface and Coating Technology, 2003, 163-164: 57-61. [25] MERCS D......
. Ltd.,Beijing 100083,China) Abstract:Cu films with thickness of about 500nm were deposited on glass substrates without heat-ing by DC magnetron sputtering in pure Ar gas of 1.0Pa. The sputtering... magnetron sputtering; sputtering power; structure; resistivity; [全文内容正在添加中] ......
; Abstract: TaNx nanoscale thin-films and Cu/TaNx multilayer structures were deposited on P-type Si(100) substrates by DC reactive magnetron sputtering... attributed to the formation of Cu3Si on TaN/Si interface, which results from Cu diffusion along the grain boundaries of polycrystalline TaN. Key words: reactive magnetron sputtering; TaNx nanoscale thin......
deposition,followed by heat treatment in vacuum.In this work,Ti-Al-C coating was prepared on austenitic stainless steels by reactive DC magnetron sputtering with a compound Ti50Al50 target,and CH4 used...Preparation of Ti2AlC MAX Phase Coating by DC Magnetron Sputtering Deposition and Vacuum Heat TreatmentZongjian Feng,Peiling Ke,Aiying WangKey Laboratory of Marine Materials and Related Technologies......
SiC长纤维表面(Al+Al2O3)复合涂层的制备张露1,石南林1,宫骏1,裴志亮1,高立军1,孙超1(1.辽宁省沈阳市科学院金属研究所)摘 要:利用反应磁控溅射法在SiC长纤维表面沉积了(Al+Al2O3)扩散阻挡涂层,研究了沉积工艺参数对涂层的成分,沉积速率的影响,以及涂层对SiC纤维的表面残余应力及力学性能的影响.结果表明,随着溅射功率的增加,Al2O3涂层的沉积速率先迅速增加后缓慢增加;随着工作气压的增加,Al2O3涂层的沉积速率先缓慢降低,在工作气压到达一定值时,沉积速率快速下降随后缓慢下降.沉积的(......
Mechanical,Microstructural and Tribological Properties of Reactive Magnetron Sputtered Cr-Mo-N FilmsDongli Qi,Hao Lei,Tiegang Wang,Zhiliang Pei,Jun Gong,Chao SunSurface Engineering of Materials... magnetron sputtering equipment coupled with two horizontal magnetron sources.The effects of substrate negative bias voltage(Vb),substrate temperature(Ts) and gas flow ratio(R= N2/(N2 + Ar......