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, Northwestern Polytechnical University, Xi an 710072, China摘 要:Radio-frequency (RF) magnetron sputtering was employed to prepare gallium phosphide (GaP) thick films on zinc sulfide (ZnS) substrates by sputtering a single crystalline GaP target in an Ar atmosphere. The infrared (IR) transmission properties, structure, morphology, composition and hardness......
target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of AZO thin films were investigated by X-ray diffractometer, scanning... sputtering method is generally used for the deposition of AZO thin films in commercial application. In the case of using a ceramic target in RF magnetron sputtering, the thin films can yield a good quality......
Passive target tracking with intermittent measurement based on random finite setLUO Xiao-bo(罗小波)1, 2, FAN Hong-qi(范红旗)1, SONG Zhi-yong(宋志勇)1, FU Qiang(付强)1(1. ATR Key Laboratory, National University... main difficulties, i.e., the poor observability of the radiation source, the detection uncertainty (false and missed detections) and the uncertainty of the target appearing/disappearing in the field......
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lime glass substrates by reactive DC sputtering from a pure Sn target. The structural, optical and electrical properties of the films were analysed as a function of the oxygen partial pressure...P-type SnO thin films prepared by reactive sputtering at high deposition ratesC.Guillén,J.Herrero摘 要:SnO is an ideally suitable p-type conductive material......
of 9.3. The working pressure of the chamber was maintained at 0.8 Pa. Pre-sputtering was performed by plasma for 15 min to clean the target surface. The deposition duration for growing the films... (threshold energy necessary to bombard the target), and scattering within the plasma. The sputtering yield is the number of atoms ejected from the target per incident ion, and is dependent on not only......
ZnO:Al Films Prepared by Reactive Mid-frequency Magnetron Sputtering with Rotating CathodeRuijiang Hong 1) and Shuhua Xu 2) 1) School of Physics and Engineering,Sun Yat-sen University,Guangzhou... substrates using a reactive mid-frequency (MF) magnetron sputtering process with rotating cathodes.The influence of deposition parameters on structural,electrical and optical properties of AZO films......
deposition,followed by heat treatment in vacuum.In this work,Ti-Al-C coating was prepared on austenitic stainless steels by reactive DC magnetron sputtering with a compound Ti50Al50 target,and CH4 used...Preparation of Ti2AlC MAX Phase Coating by DC Magnetron Sputtering Deposition and Vacuum Heat TreatmentZongjian Feng,Peiling Ke,Aiying WangKey Laboratory of Marine Materials and Related Technologies......
by magnetron sputtering deposition process in the argon (Ar) atmosphere. The depositing system was configured three magnetron target positions which focused on a substrate seat. High pure graphite target... Trans. Nonferrous Met. Soc. China 22(2012) 1372-1380 Influence of Ti target current on microstructure and properties of Ti-doped graphite-like carbon films WANG Yong-xin1, 2, WANG Li-ping1, XUE......
frequency (RF) magnetron sputtering method using one Al/Mg co-target and one boron target. The thickness of the as-deposited thin film was controlled to 500 nm by adjusting deposition time. The influences of sputtering powers on the elemental contents and structural and mechanical properties were investigated by electron probe microanalysis (EPMA), X-ray diffraction (XRD), high-resolution......