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低能离子束辅照对溅射镀TiN膜生长的影响 华学明1,三宅正司2,李铸国1,吴毅雄1 (1.上海交通大学材料科学与工程学院,上海,200030;2.近畿大学,大阪,5778502,日本) 摘要:用诱导型等离子体辅助磁控溅射装置在Si(100)表面低温沉积TiN膜,研究了高密度低能量(≈20 eV)离子束辅照对溅射镀TiN膜生长,结构和性能的影响.结果表明,高密度低能离子束辅照会改变TiN膜的择优生长方向并使薄膜致密化.即使沉积温度低于150℃,当入射基板离子数和Ti原子数的比值Ji/JTi≥4.7时,沉积的TiN膜仍可具有完全的(200)面择优生长,薄膜微观结构致密,硬度达到25 GPa,残余压应力小. 关键词:TiN薄膜; 物理气相沉积(PVD); 择优取向; 离子照射; [全文内容正在添加中] ......
800/cm范围内,未发现明显的吸收峰.这些优良的光学特性表明,采用非平衡磁控溅射技术制备的无氢DLC膜可以作为窗口的红外增透保护膜使用. 关键词:类金刚石膜(DLC); 非平衡磁控溅射(UBMS); 厚度均匀性; 物理气相沉积(PVD); diamond-like carbon films (DLC); unbalanced magnetron sputtering (UBMS); thickness uniformity; physical vapor deposition (PVD); [全文内容正在添加中] ......
physical vapor deposition(PVD), anodization, electrodeposition and hydrothermal treatment. Anodic Al2O3 layer with micrometric pore diameter was formed by anodization of the PVD-deposited aluminum film.... A mechanism of dissolution-recrystallization was also proposed for the formation of CRHA. Key words: anodic Al2O3; hydroxyapatite; biocomposite coating; medical metals; PVD; electrodeposition......
多层复合渗镀TiN耐蚀性的研究 高原1,王建忠1,隗晓云1,徐重1,徐晋勇1,刘燕萍1 (1.太原理工大学表面工程研究所,太原,030024;2.桂林电子工业学院,桂林,541004) 摘要:采用双层辉光渗金属技术,在碳钢表面形成具有扩散层和沉积层的TiN复合渗镀层.对复合渗镀,PVD以及复合渗镀+PVD三种工艺制备的TiN层表面形貌,成分及在10%H2SO4和3.5%NaCl溶液中的耐蚀性能进行了对比试验研究.结果表明:复合渗镀+PVD法沉积的TiN薄膜呈较为均匀,致密,细小的组织,Ti和N原子由表层呈梯度向内分布.与PVD法沉积的TiN层不同,是属于冶金扩散结合层,渗镀层厚度可达10 μm以上.在10%H2SO4和3.5%NaCl溶液中,渗镀层的腐蚀速度分别为0.156g/(m2·h)和0.025g/(m2·h),显示出了优异的耐蚀性. 关键词:辉光等离子; PVD; TiN......
influence of the values of discharge voltage on the coating structure and durability of edges coated with boron nitride. 关键词:wear resistant coatings; durability; PVD; [全文内容正在添加中] ......
susceptibility to brittle cracking. 关键词:wear-resistant coatings; PVD; brittleness; structure; [全文内容正在添加中] ......
efficient tool forthe development and optimization of new multicomponent functional materials. Key words:combinatorial chemistry; hard coating; PVD; magnetron sput-tering; [全文内容正在添加中] ......
with PVD system. The estimation result shows a good coincidence with the FEM calculating result and shows some difference with the lab experiment result, which is within the margin of error. Analysis...; PVD; soilbag; consolidation 经典理论对于砂井地基固结问题的求解是对砂井周围影响区域进行假设,将其等效简化为圆形区域进行推导计算[1-5].实际上,在真实施工条件[6-9]下,排水板的打设存在一机多带同步施工,两排或者三排排水板同时打设,最终形成的砂井影响区域是正方形或者是正六边形[10-11],而简化为圆形区域则将与实际情况存在一定偏差.在圆形区域形状的固结理论中,对于......
to the physical vapor deposition (PVD) TiN coating were investigated. The results show that the TiCN coating features a thickness of 15 μm with a primary phase of TiC0.3N0.7. The wear rates of the two coatings have no clear distinction at low applied loads. However, severe abrasive wear appears in the PVD TiN coating when the applied load exceeds 30 N, while the TiCN coating features better wear......
层以及在碳钢基体表面直接用PVD法沉积TiN薄膜的表面形貌,结构,耐蚀性进行了检测和分析.结果表明:等离子渗镀的复合渗镀TiN/Ti层表面为均匀起伏的胞状物,Ti和N原子由表层呈梯度沿基体向内分布,属于冶金扩散层;用等离子渗金属技术等形成的复合渗镀TiN沉积层+TiN析出相+Ti扩散层,其表面形貌是为均匀,致密,细小的组织,平均硬度达到2500HV0.1左右,渗镀层厚度达十几微米,TiN层择优取向为(200)晶面;而PVD法直接沉积TiN薄膜厚度较薄,晶粒以不规则形式分布在基体上.在0.5mol/L H2SO4溶液中腐蚀性能表明,复合渗镀TiN沉积层+TiN析出相+Ti扩散层的耐蚀性较好. 关键词:等离子辉光放电; PVD; TiN; 耐蚀性; 组织结构; [全文内容正在添加中] ......