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a dc reactive magnetron sputtering. The XRD and ultramicro-indentor were employed to investigate the effects of reaction gas partial pressure and substrate bias on structural, mechanical properties... hardness and 2.2 GPa internal stress. Its structural and mechanical properties kept high-temperature stability before and after annealing . 关键词:ZrAlN coating; magnetron sputtering; thermal stability; [全文......
Trans A, 1989, A20: 2217-2249. [12]Koski K, Holsa J, Juliet P. Properties of zirconium oxide thin films deposited by pulsed reactive magnetron sputtering[J]. Surf Coat Technol, 1999, 120-121: 303-312...键词: 磁控溅射; 化学镀; 金属薄膜 中图分类号: TB43.1 文献标识码: A Relationship between plating and magnetron sputtering for metallic films TANG Wu1, DENG Long-jiang1, XU Ke-wei2 (1. School of Microelectronic and Solid......
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TRIBOLOGICAL AND HIGH SPEED TURNING PERFORMANCE IN Ti1-xAlxN COATINGS PREPARED BY CLOSE-FIELD UNBALANCED MAGNETRON SPUTTERING Y.G. Shen1,Z.F. Zhou1,T.H. Wong1,K.Y. Li1,M. Escursell1,P.W. Shum1...-aluminium-nitride (Ti1-xAlxN) coatings were deposited by close-field unbalanced magnetron sputtering on M42 steel substrates and WC-6wt%Co inserts at 450℃. The tribological behavior was analyzed......
Tribological behavior of magnetron sputtering CrMoN/MoS2 composite coatingsYuelan DI,Zhihai CAI,Ping ZHANG,Zhen YANG,Qi LI and Wei SHEN Department of Equipment Remanufacturing Engineering,Academy of Armored Forces Engineering,Beijing 100072,China摘 要:CrMoN composite coatings were deposited on the surface of the stainless steel by magnetron sputtering......
直流磁控反应溅射制备IrO2薄膜 罗维根1,王世军1,仇萍荪1,何夕云1,丁爱丽1 (1.中国科学院上海硅酸盐研究所无机功能材料开放实验室, 上海 200050) 摘要:为研究氧化铱(IrO2)对PZT铁电薄膜疲劳性能的影响,利用直流(DC)磁控反应溅射(sputtering)工艺成功地在SiO2/Si(100)衬底上制得了高度取向的IrO2薄膜. 并在其上制成PZT铁电薄膜. 讨论了溅射参数(溅射功率,Ar/O2比,衬底温度)以及退火条件对氧化铱薄膜的结晶,取向和形态的影响. 关键词:氧化铱薄膜; 直流磁控反应溅射; 热退火; IrO2 thin film; DC magnetron reactive sputtering; thermal annealing; [全文内容正在添加中] ......
Some New Views on the Principles of Magnetron Sputtering FANG Kai-ming1,TONG Hong-Hui1,ZHAO Jia-xue1 (1.Southwestern Institute of Physics, Chengdu, 610041, Sichuan, P. R. China) 摘要:In this paper, some common phenomena in magnetron sputtering are freshly analyzed and discussed on the basis of the motion of electrons in non-uniform orthogonal electric and magnetic fields. There exist magnetic......
Applications of Cr-Based Metal Nitride Hard Coatings Using Multi-Magnetron Sputtering Sources and Elemental Metal Targets D.G. Teer1,Eric Wiemann2,Shicai Yang1 (1.Teer Coatings Ltd., West Stone...) 摘要:Cr-based nitride hard coatings were produced by multi-magnetron sputtering sources using elemental metal materials. Cr, Ti, Mo, V, Al, and Y target materials were used for the metal sources......
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Corrosion Behaviour of Annealed Cnx/Tiny Multilayers ZOU Yang1,ZHANG Shao-hua1,FU Qiang1,PAN Chun-xu1,ZHANG Guo-dong1,ZHANG Fu-ju1 (1.Wuhan University, Wuhan, P.R..China) 摘要:The corrosion behaviour of annealed CNx/TiNy multilayers have been investigated using potentiodynamic test in a 0.5MH2SO4 solution. The coating has been deposited on W6Mo5Cr4V2 steel by reactive magnetron sputtering......