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SiC长纤维表面(Al+Al2O3)复合涂层的制备张露1,石南林1,宫骏1,裴志亮1,高立军1,孙超1(1.辽宁省沈阳市科学院金属研究所)摘 要:利用反应磁控溅射法在SiC长纤维表面沉积了(Al+Al2O3)扩散阻挡涂层,研究了沉积工艺参数对涂层的成分,沉积速率的影响,以及涂层对SiC纤维的表面残余应力及力学性能的影响.结果表明,随着溅射功率的增加,Al2O3涂层的沉积速率先迅速增加后缓慢增加;随着工作气压的增加,Al2O3涂层的沉积速率先缓慢降低,在工作气压到达一定值时,沉积速率快速下降随后缓慢下降.沉积的(......
and analysis of In2O3-SnO2 thin films deposited by magnetic sputtering LI Shi-tao, QIAO Xue-liang, CHEN Jian-guo (State Key Laboratory of Die and Mould Technology, Huazhong University of Science and Technology, Wuhan 430074, China) Abstract: The ITO thin films were prepared by radio frequency magnetic sputtering using a ceramic target with mass ratio of In2O3 to SnO2 1∶1. The experiment parameters......
-target magnetron sputtering system in an Ar-N 2 gas mixture. The Ti-Si-N films were investigated by characterization techniques such as X-ray diffraction (XRD), atomic force microscope (AFM), electron... that magnetron sputtering is a promising method to deposit hard films onto soft substrate.关键词:......
Dependence of characteristics of LaB6 films on DC magnetron sputtering power XU Jing(徐 静)1, 2, MIN Guang-hui(闵光辉)1, HU Li-jie(胡立杰)1, ZHAO Xiao-hua(赵晓华)1, YU Hua-shun(于化顺)1 1. School of Materials...: Lanthanum hexaboride(LaB6) thin films were deposited on glass substrate by DC magnetron sputtering technology, and the AFM, XRD and scratch tests were used to characterize the deposited films. Influences......
系统; 磁记录介质; FePt/Ti granular films; facing-target magnetron sputtering system; magnetic recording media; [全文内容正在添加中] ......
磁控溅射法制备TiB2涂层的研究进展 李立1,张隆平1,何庆兵1,孙彩云1,吴护林1 (1.中国兵器工业第五九研究所,重庆,400039) 摘要:TiB2熔点高,硬度高,密度低,电阻率低,高温下化学稳定性好,是一种应用潜力巨大的涂层材料.磁控溅射法是一种重要的制备TiB2涂层的物理气相沉积方法,具有沉积温度低,基体可选择范围大的优点.分析和总结了偏压大小与极性,基体温度和气压等工艺参数对涂层沉积速率,显微结构(包括形貌,结晶度,织构和晶粒尺寸等),性能(包括硬度,弹性模量,结合强度和摩擦学性能)和残余应力的影响,并概括了目前降低残余应力的途径. 关键词:TiB2涂层; 磁控溅射法; 性能; 残余应力; TiB2 coating; magnetron sputtering method; properties; residual stress; [全文内容正在添加中] ......
系统; 磁记录介质; FePt/Ti granular films; facing-target magnetron sputtering system; magnetic recording media; [全文内容正在添加中] ......
Preparation of YBa2Cu3O7-x Superconductor Film by Ion Beam Sputtering胡倾宇,闻立时,乔桂文,庄育智摘 要:<正> Since the discovery of high Tc super-conductor, much... for mi-croelectronic application are preparedby PVD method, such as electron beamevaporation, pulsed laser evaporation andmagnetron sputtering. In this paper, thepreliminary results of ion beam......
Influence of Sputtering Pressure on the Structure and Mechanical Properties of Nanocomposite Ti-Si-N Thin FilmsVipin Chawla1,2,R.Jayaganthan1,Ramesh Chandra21. Department of Metallurgical...="ChDivSummary" name="ChDivSummary">Nanocomposite Ti-Si-N thin films have been deposited on Si (100) substrate by direct current/radio frequency (DC/RF) magnetron sputtering. The effect of varying deposition......
magnetron sputtering for orthopedic implant applications: A comparative study Ashish DAS1, 2, Mukul SHUKLA1, 3, 4 1. Department of Mechanical Engineering, Motilal Nehru National Institute of Technology...-implants, such as osteointegration and antibacterial character. In the present study, thin hopeite coatings were produced by Pulsed laser deposition (PLD) and radio frequency magnetron sputtering (RFMS......
