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Microstructure and Mechanical Property of Magnetron Sputtering Deposited DLC Film孙泽1,2,ZHAO Wen1,孔德军11. School of Mechanical Engineering, Changzhou University2. College of Mechanical Engineering, Donghua University摘 要:A diamond-like carbon(DLC) film was deposited on YT14 substrate using magnetron sputtering(MS). The surface morphologies, roughness......
multi-composite hard films were deposited by ion beam assisted reactive mid-frequency magnetron sputtering. Auger electron spectroscopy, transmission electron microscopy, X-ray diffractometry... Ming-jiang, HOU Hui-jun, ZHU Xia-gao, LI Hong-wu, LIN Kai-sheng, DAI Da-huang. Characterization and growth of (Cr, Ti, Al) N films by ion beam assisted twin-target reactive magnetron sputtering[J......
) and selective DC magnetron sputtering techniques were combined. The deposited film thicknesses were measured by X-ray diffraction (XRD). As a result, the magnetization of the film on the fabricated... applications. Key words:GM actuator; magnetostriction; trilayered film; magnetron sputtering; magnetization; rare earths; [全文内容正在添加中] ......
id="ChDivSummary" name="ChDivSummary">Alumina thin films were deposited on fused quartz and SS304 substrate by pulsed rf magnetron sputtering with both direct and reactive methods.The films were... emittance of the substrate also remains almost constant after deposition of thin alumina film.Further,as-deposited alumina on SS304 obtained by both direct and reactive sputtering process was amorphous......
magnetron sputtering (DC-MS) source of carbon and a high power impulse magnetron sputtering (HIPIMS) source of Cr with reactive gas of C2H2. The hydrogen-free GLC and Cr-doped GLC films were also... sputtering (dc-MS) source of carbon and a high power impulse magnetron sputtering (HIPIMS) source of Cr with reactive gas of C2H2. The hydrogen-free GLC, Cr-doped GLC films (Cr-GLC) and the Cr-doped hydrogen......
反应溅射 NiCrOx薄膜过程及其光学性质的研究 胡行方1,曹韫真1 (1.中国科学院上海硅酸盐研究所,上海 200050) 摘要:研究了反应气体流量对磁控反应溅射NiCrOx薄膜成分和光学常数的影响. 在反应溅射过程中,NiCr靶随着O2流量的增大出现毒化现象. 在不同氧流量条件下可沉积出近于透明的介电薄膜和不透明的吸收薄膜. 对薄膜光学常数的研究可应用到太阳能光谱选择性吸收薄膜的制备. 关键词:磁控反应溅射; NiCrOx薄膜; 光学常数; 光谱选择性吸收表面; magnetron reactive sputtering; NiCrOx thin films; optical constants; solar selective surface; [全文内容正在添加中] ......
on Al-bronze and silicon (100) substrates using metallic Zr, Nb and Al targets with 99.95% purity by a reactive DC unbalanced magnetron sputtering system. Sputtering sources were from four element targets.... [4] BRAIC M, BALACEANU M, VLADESCU A, ZOITA C N, BRAIC V. Study of (Zr,Ti)CN, (Zr,Hf)CN and (Zr,Nb)CN films prepared by reactive magnetron sputtering [J]. Thin Solid Films, 2011, 519(12): 4092-4096. [5......
磁控溅射制备ZrN_x薄膜离子导体性能研究 董思勤1,覃丽禄1,黄佳木2 (1.重庆大学,材料科学与工程学院,重庆,400045;2.重庆大学,国家镁合金材料工程技术研究中心,重庆,400044) 摘要:采用射频反应磁控溅射工艺,以纯Zr为靶材,在WO3/ITO/Glass基片上采用不同工艺参数沉积ZrN_x薄膜,用紫外-可见分光光度计,循环伏安法,X射线衍射仪,扫描电镜等研究了ZrN_x薄膜的离子导电性能.研究结果表明,所制备的ZrN_x薄膜为非晶态,ZrN_x/WO_3/ITO/Glass复合膜的光学调节范围最大达57%以上,在离子传导过程中表现出良好的离子导电性能. 关键词:射频反应磁控溅射; 氮化锆薄膜; 离子导体; reactive magnetron sputtering; zirconium nitride films; ion conductor; [全文内容......
退火气氛对SnO2薄膜结构与成分的影响 杜军1,王磊1,毛昌辉1 (1.北京有色金属研究总院先进电子材料研究所,北京,100088) 摘要:研究了低氧分压反应溅射法生长的SnO2薄膜于600℃ O2气氛和Ar气氛退火处理后的表面形貌,晶体结构以及表面成分,发现经氧化性气氛退火处理的SnO2为具有金红石结构的表面多孔薄膜.相比较而言,Ar气氛退火处理后的SnO2薄膜表面较为致密,相结构包含朱氧化完全的β-Sn.XPS分析进一步表明,氧化性气氛退火形成单一组分的SnO2,而惰性气氛退火后薄膜表面含有Sn,SnO和SnO2.另外,研究还发现薄膜表面吸附氧形态与退火气氛有关. 关键词:二氧化锡; 薄膜; 反应磁控溅射; 退火气氛; tin dioxide; thin film; reactive magnetron sputtering; annealing atmospheres......
Microstructure and Properties of the Cr–Si–N Coatings Deposited by Combining High-Power Impulse Magnetron Sputtering(HiPIMS) and Pulsed DC Magnetron SputteringTie-Gang Wang1,2,Yu Dong1,Belachew Abera... sputtering and pulsed DC magnetron sputtering. The Si content in the coating was adjusted by changing the sputtering power of the Si target.By virtue of electron-probe microanalysis, X-ray diffraction......