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of brass nanofilms sputtered on acrylics substrate was studied through experimental investigation of the effect of sputtering voltage, target-to-substrate distance, chamber pressure and sputtering... fraction). High sputtering voltage and short target-to-substrate distance help to improve brass nanofilm deposition rate. There exists an optimal chamber pressure where deposition rate of nanofilm......
Electrical and optical properties of ZnO:Al films with different hydrogen contents in sputtering gasFei Qu,Teng Zhang,Hong-Wei Gu,Qing-Quan Qiu,Fa-Zhu Ding,Xing-Yu Peng,Hong-Yan WangApplied... current magnetron sputtering in incorporating hydrogen in sputtering gas at room temperature. The influences of hydrogen content in sputtering gas on the structural, optical, and electrical properties......
Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan 030024, China) Abstract:A new net-shape cathode sputtering target which has a simple structure and a high sputtering was put... of TC4 with the method of net-shape cathode glow discharge, which further improved the corrosion-resistance of TC4 and formed good corrosion-resistant alloys. Key words:TC4 (Ti6Al4V); cathode sputtering......
Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering ParametersFa-Yu Wu1,Jian-Wei Li1,Yi Qi2,Wu-Tong Ding3,Yuan-Yuan Guo1,Yan-Wen Zhou11. Laser Advanced... sputtering from powder targets and were characterized by X-ray photoelectron spectroscopy,X-ray diffraction,transmission electron microscopy,atomic force microscopy,surface profile,UV–Vis spectroscopy......
Effect of the Sputtering Parameters on the Structure and Properties of Cu3N Thin Film Materials钱显毅1,黄致新21. School of Electronic Information & Electric Engineering,Changzhou Institute of Technology2... substrates by reactive radio frequency magnetron sputtering.The effects of sputtering parameters on the structure and properties of the films were studied.The experimental results show that with increasing......
Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systemsJun Zhou, Zhe Wu, and Zhanhe Liu School of Aeronautic Science and Technology, Beijing University of Aeronautics and Astronautics, Beijing 100083, China摘 要:Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux......
Microstructure and Mechanical Property of Magnetron Sputtering Deposited DLC Film孙泽1,2,ZHAO Wen1,孔德军11. School of Mechanical Engineering, Changzhou University2. College of Mechanical Engineering, Donghua University摘 要:A diamond-like carbon(DLC) film was deposited on YT14 substrate using magnetron sputtering(MS). The surface morphologies, roughness......
sputtering.Chemical states analysis was carried out,indicating that valence states of element W in the films were W4+ and W6+.The effects of sputtering power and film thickness on the surface morphology,optical... their respective optimum values as sputtering power and thickness changed.The asdeposited IWO film with the minimum resistivity of 3.23 × 10-4 Ω cm was obtained at a sputtering power of50 W......
Microstructure and Properties of the Cr–Si–N Coatings Deposited by Combining High-Power Impulse Magnetron Sputtering(HiPIMS) and Pulsed DC Magnetron SputteringTie-Gang Wang1,2,Yu Dong1,Belachew Abera... sputtering and pulsed DC magnetron sputtering. The Si content in the coating was adjusted by changing the sputtering power of the Si target.By virtue of electron-probe microanalysis, X-ray diffraction......
Structural,Wettability and Optical Investigation of Titanium Oxynitride Coatings:Effect of Various Sputtering ParametersSushant K Rawal1,2,3,R.Jayaganthan1,5,Ramesh Chandra21. Centre... the effect of various sputtering parameters such as nitrogen flow rate,deposition time and sputtering pressure on structural,wettability and optical properties of titanium oxynitride films deposited......
