Annealing effect and irradiation properties of HFCVD diamond films

来源期刊:中国有色金属学报(英文版)2006年第z1期

论文作者:任玲 王林军 苏青峰 刘健敏 徐闰 彭鸿雁 史伟民 夏义本

文章页码:317 - 320

Key words:diamond film; hot filament chemical vapor deposition(HFCVD); annealing; radiation

Abstract: The post-growth treatment of a [100]-oriented diamond film was performed to improve the film quality. The characteristic of post-growth film was investigated by using the RAMAN spectrum and the capacitance?frequency curve. The results show that the resistivities and frequency response enhance after the post-treatments in solution of H2SO4 and H2O2 and an annealing under N2 atmosphere at 500 ℃ for 60 min. Under a bias voltage of 100 V, the net photocurrent is obtained under 55Fe(5.9 keV) X-rays and 241Am (5.5 MeV) a particles radiation, respectively. The photocurrent increases rapidly at first and becomes stable for the “pumping” effect with the radiation time.

基金信息:Shanghai Leading Academic Discipline, China

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