Spin Coating Epitaxial Films
来源期刊：材料导报2019年第12期
论文作者：常晶晶
文章页码：1919 - 1920
摘 要：<正>Epitaxy is usually used to produce high quality crystals with atomic perfection. Up to now,many semiconductor crystals of functional materials could be obtained by epitaxial growth techniques,such as molecular beam epitaxy,chemical vapor deposition,and liquid-phase epitaxy. However,these techniques are expensive,sophisticated,and not compatible with large area production. For solution-based deposition of epitaxial films such as hydrothermal processing[1],chemical bath deposition[2-3],and electrodeposition[4-5],specific conditions such as high temperature and pressure,or conducting substrates are commonly needed. Since single
常晶晶
State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology,Shaanxi Joint Key Laboratory of Graphene,School of Microelectronics,Xidian UniversityAdvanced Interdisciplinary Research Center for Flexible Electronics,Xidian University
摘 要：<正>Epitaxy is usually used to produce high quality crystals with atomic perfection. Up to now,many semiconductor crystals of functional materials could be obtained by epitaxial growth techniques,such as molecular beam epitaxy,chemical vapor deposition,and liquid-phase epitaxy. However,these techniques are expensive,sophisticated,and not compatible with large area production. For solution-based deposition of epitaxial films such as hydrothermal processing[1],chemical bath deposition[2-3],and electrodeposition[4-5],specific conditions such as high temperature and pressure,or conducting substrates are commonly needed. Since single
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